Method for improving conductivity of silicon powder
A conductivity and silicon powder technology, which is applied in the field of new energy nanomaterial preparation, can solve the problem of low conductivity of silicon materials, and achieve the effect that the conductivity can be precisely controlled
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Embodiment 1
[0028] A method for improving the conductivity of silicon powder described in this embodiment specifically includes the following steps.
[0029] (1) Clean the p-type silicon powder raw material with acetone and aqueous solution in sequence.
[0030] (2) Then, stir and mix the cleaned p-type silicon powder, boric acid and ultrapure water at a mass ratio of 1:1:1, the solution temperature is 25°C, and the stirring time is 30 minutes, and then the mixed p-type silicon powder Filter and dry.
[0031] (3) Finally, the above-mentioned mixed p-type silicon powder is heat-treated under a protective atmosphere, the treatment temperature is 900° C., and the treatment time is 60 minutes.
[0032] This method can be used to obtain a conductivity of 5×10 3 S / cm p-type silicon powder.
Embodiment 2
[0034] A method for improving the conductivity of silicon powder described in this embodiment specifically includes the following steps.
[0035] (1) Clean the p-type silicon powder raw material with acetone and aqueous solution in sequence.
[0036] (2) Then, stir and mix the cleaned p-type silicon powder and aluminum paste for solar cells at a mass ratio of 1:1, the solution temperature is 60°C, and the stirring time is 60 minutes, and then the mixed p-type silicon powder is pumped Filter and dry.
[0037] (3) Finally, the above-mentioned mixed p-type silicon powder is heat-treated under a protective atmosphere, the treatment temperature is 900° C., and the treatment time is 60 minutes.
[0038] Using this method, the conductivity can be obtained as 3×10 3 S / cm p-type silicon powder.
Embodiment 3
[0040] A method for improving the conductivity of silicon powder described in this embodiment specifically includes the following steps.
[0041] (1) Clean the n-type silicon powder raw material with acetone and aqueous solution in sequence.
[0042] (2) Then stir and mix the cleaned n-type silicon powder, phosphoric acid and ultrapure water according to the mass ratio of 1:1:1, the solution temperature is 50°C, and the stirring time is 60 minutes, and then the mixed n-type silicon powder Filter and dry.
[0043] (3) Finally, the above-mentioned mixed n-type silicon powder is heat-treated under a protective atmosphere, the treatment temperature is 850° C., and the treatment time is 60 minutes.
[0044] Using this method can obtain a conductivity of 2×10 3 S / cm n-type silicon powder.
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