Silicon powder doping method
A technology of silicon powder and phosphorus powder is applied in the field of preparation of new energy nanomaterials, which can solve the problems of low conductivity of silicon materials, and achieve the effect of solving the problem of low conductivity and accurately controllable conductivity.
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Embodiment 1
[0022] A silicon powder doping method described in this embodiment specifically includes the following steps.
[0023] (1) Use acetone, hydrofluoric acid, and ultrapure water to clean and dry the n-type silicon powder raw material with a conductivity of 1S / cm in sequence.
[0024] (2) Then place the cleaned silicon powder and phosphorus powder in a tube furnace for zone heating, using argon as a protective atmosphere, the temperature at the silicon powder is 800°C, the temperature at the phosphorus powder is 300°C, and the heat treatment time is 30min .
[0025] (3) Finally, the heat-treated silicon powder is cleaned and dried with hydrofluoric acid and ultrapure water in sequence.
[0026] Using this method can obtain a conductivity of 8×10 3 S / cm n-type silicon powder.
Embodiment 2
[0028] A silicon powder doping method described in this embodiment specifically includes the following steps.
[0029] (1) Use acetone, hydrofluoric acid, and ultrapure water to clean and dry the p-type silicon powder raw material with a conductivity of 1S / cm in sequence.
[0030] (2) Then place the cleaned silicon powder and phosphorus powder in a tube furnace for zone heating, using argon as the protective atmosphere, the temperature at the silicon powder is 820°C, the temperature at the phosphorus powder is 300°C, and the heat treatment time is 30min .
[0031] (3) Finally, the heat-treated silicon powder is cleaned and dried with hydrofluoric acid and ultrapure water in sequence.
[0032] Using this method can obtain a conductivity of 4×10 3 S / cm n-type silicon powder.
Embodiment 3
[0034] A silicon powder doping method described in this embodiment specifically includes the following steps.
[0035] (1) Use acetone, hydrofluoric acid, and ultrapure water to clean and dry the n-type silicon powder raw material with a conductivity of 1S / cm in sequence.
[0036] (2) Then mix the cleaned silicon powder and phosphorus powder and place them in a tube furnace for heating, using argon as the protective atmosphere, the treatment temperature is 760°C, and the heat treatment time is 60 minutes.
[0037] (3) Finally, the heat-treated silicon powder is cleaned and dried with hydrofluoric acid and ultrapure water in sequence.
[0038] Using this method can obtain a conductivity of 2×10 3 S / cm n-type silicon powder.
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