Ordered large-area single-layer microspheres/nanospheres assisted by template and preparation method thereof

A large-area, nanosphere technology, applied in separation methods, chemical instruments and methods, and processes for producing decorative surface effects, etc., can solve problems such as unstable spectral response, lattice defects, and poor batch repeatability, and achieve Improve chaotic direction, reduce lattice defects, and achieve high order effect

Inactive Publication Date: 2016-09-21
SOUTH CHINA NORMAL UNIVERSITY
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  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although this method has many advantages, the single-layer nanosphere structure prepared by it always has problems such as changeable direction, frequent occurrence of multi-layers, and lattice defects, which seriously affect its long-range order. It leads to problems such as unstable spectral response and poor batch repeatability, which in turn limits its performance in practical applications

Method used

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  • Ordered large-area single-layer microspheres/nanospheres assisted by template and preparation method thereof
  • Ordered large-area single-layer microspheres/nanospheres assisted by template and preparation method thereof
  • Ordered large-area single-layer microspheres/nanospheres assisted by template and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0027] (1) Cut the 5-inch N-type silicon wafer into multiple small-sized silicon wafers of 3cm*3cm, and cut the glass slide into small pieces.

[0028] (2) Sonicate the cut silicon chip and slide glass in acetone, isopropanol, ethanol, and deionized water for 10 minutes respectively, and soak them in 5% hydrofluoric acid, then rinse them with deionized water, and Remove surface oil, metal and other impurities;

[0029] (3) Use the HMDS pretreatment system to treat the cleaned silicon wafer to make its surface hydrophobic;

[0030] (4) Prepare the mask plate required for the ultraviolet lithography, which contains periodic structures of square, circular, hexagonal and irregular shapes with different sizes from 4 μm to 60 μm.

[0031] (5) Put the processed silicon wafers into the homogenizer for homogenization. AZ5214e photoresist is used. The homogenization parameters are 500 rpm for the first stage, 5 seconds of rotation, and 6000 revolutions for the second stage. / minute,...

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Abstract

The invention discloses ordered large-area single-layer microspheres/nanospheres assisted by a template and a preparation method thereof, and belongs to the technical field of preparation of a semiconductor material. According to the method, a structure with a certain size is produced on a substrate, and an obtained product is used as the template; and single-layer microspheres are deposited on the template, and after liquid is evaporated, an ordered large-area single-layer microsphere/nanosphere structure assisted by the template is obtained. The ordered large-area single-layer microspheres/nanospheres obtained by the invention have few defects, are high in orientation orderness, and nearly have no multi-layer phenomenon; and when the microspheres/nanospheres are visually observed from a scanning electron microscope photograph, excellent orderness of the ordered large-area single-layer microspheres/nanospheres can be seen.

Description

technical field [0001] The invention belongs to the technical field of semiconductor material preparation, and in particular relates to an ordered large-area single-layer micro / nano sphere assisted by a template and a preparation method thereof. Background technique [0002] Nanostructure refers to the structure composed of one-dimensional, two-dimensional, and three-dimensional nano-objects whose size is between the molecular and micron scales. Due to the good spectral response in the light band, the long-range ordered nanostructure has important application value in many fields such as optical communication devices, optical sensor devices, and surface Raman enhancement technology. [0003] The preparation methods of long-range ordered nanostructures mainly include traditional semiconductor processing techniques (electron beam direct writing, focused ion beam etching, etc.), nanoimprinting, and nanosphere self-assembly. Among them, the preparation of two-dimensional single...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B81C1/00B81B1/00
CPCB81C1/00103B81B1/00
Inventor 薛亚莉张渊刘芬胡治朋
Owner SOUTH CHINA NORMAL UNIVERSITY
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