ZnO/SiC/Si heterojunction solar battery and preparation method thereof
A solar cell and heterojunction technology, which is applied in circuits, photovoltaic power generation, electrical components, etc., can solve the problems of large lattice mismatch and thermal mismatch, and it is difficult to epitaxially produce ZnO single crystal thin films, so as to improve the crystal quality. , improve the photoelectric conversion efficiency, the effect of low cost
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Embodiment 1
[0034] Example 1. Preparation of ZnO / SiC / Si heterojunction solar cells provided by the present invention
[0035] 1) After cleaning the Si substrate, put it into the preset vacuum chamber of the MOCVD system, send the Si substrate in the preset vacuum chamber into the high-temperature reaction chamber through the sample delivery mechanism, remove the oxygen on the surface of the Si substrate, and then Using silane and propane as the reaction source and trimethylaluminum as the dopant source, the SiC layer was vapor-phase deposited at 1350° C. under a hydrogen atmosphere; wherein, the flow rates of silane and propane were 80 ml / min and 2 ml / min, respectively, The flow rate of hydrogen gas is 2 liters / min, and trimethylaluminum is fed after 15 minutes of deposition, the source temperature is 20°C, the flow rate is 2 ml / min, the pressure in the reaction chamber is 5000 Pa during the whole growth process, and the deposition time is 1 hour to obtain SiC layer with a thickness of 10...
Embodiment 2
[0038] Example 2, preparation of the ZnO / SiC / Si heterojunction solar cell provided by the present invention
[0039] 1) After cleaning the Si substrate, put it into the tube furnace of the CVD system, and then use silane and propane as the reaction source to vapor-deposit the SiC layer at 1350°C in a hydrogen atmosphere under normal pressure; among them, silane and propane The flow rates are 80 ml / min and 2 ml / min respectively, the flow rate of hydrogen is 2 liters / min, trimethylaluminum is fed after 15 minutes of deposition, the source temperature is 20° C., and the flow rate is 2 ml / min. A SiC layer with a thickness of 1000 nm was obtained after a total deposition time of 40 minutes.
[0040] 2) Stop passing silane and propane, lower the temperature to 500°C, then pass in water vapor and diethyl zinc with a molar ratio of 1:2, start to deposit ZnO film, and pass through a source temperature of 20°C after 10 minutes Trimethylaluminum was grown at a flow rate of 2 ml / min for ...
Embodiment 3
[0042] Example 3, preparation of the ZnO / SiC / Si heterojunction solar cell provided by the present invention
[0043] 1) After cleaning the Si substrate, put it into the preset vacuum chamber of the MOCVD system, send the Si substrate in the preset vacuum chamber into the high-temperature reaction chamber through the sample delivery mechanism, remove the oxygen on the surface of the Si substrate, and then Using silane and propane as the reaction source and trimethylaluminum as the dopant source, the SiC layer was vapor-phase deposited at 1100° C. under a hydrogen atmosphere; wherein, the flow rates of silane and propane were 50 ml / min and 2 ml / min, respectively, The flow rate of hydrogen gas is 2 liters / minute, and trimethylaluminum is introduced after 15 minutes of deposition, the source temperature is 20°C, the flow rate is 3 ml / minute, the pressure in the reaction chamber is 1000 Pa during the whole growth process, and after 60 minutes of deposition, the obtained SiC layer w...
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