An intelligent source baffle system and method for preparing hard coating thereof

Abstract

The invention relates to an intelligent source baffle plate system and a method thereof for preparing a hard coating. The system comprises a vacuum chamber, a circular gear ring, an intelligent source baffle plate, a gear reducer motor and a magnetofluid sealing transmission shaft. The method comprises the steps of (1) carrying out coating pretreatment; (2) carrying out vacuum pumping; (3) starting argon ion bombardment cleaning; (4) continuously carrying out high vacuum pumping to (4.0 to 9.0) * 10<-3> Pa, and carrying out target source predischarge cleaning; (5) continuously carrying out high vacuum pumping till the vacuum degree reaches 3.0 * 10<-3> Pa or above; (6) detecting the leakage rate of the vacuum chamber; (7) carrying out main arc metal ion bombardment and preparing a metal transition layer; (8) preparing a nitride coating through plating; and (9) after coating, inflating the vacuum chamber which is cooled to 150 to 250 DEG C, and after inflation, opening a door of the vacuum chamber to take out a workpiece. According to the system and the method, the content of residual gases in the vacuum chamber can be effectively decreased, the bonding strength of the hard coating and the surface of a base material and the performance of the hard coating are improved, mutual pollution between different cathode targets can be effectively prevented, and the quality and performance of a multi-layer or composite coating are improved.

Description

technical field [0001] The invention belongs to the technical field of vacuum coating, and in particular relates to an intelligent source baffle system and a method for preparing a hard coating. Background technique [0002] Factors affecting vacuum coating performance (considered from the perspective of cathodic arc target source CAE): [0003] (1) Release of gas [0004] The surface of any material will absorb gas in the air, and gradually release it under vacuum conditions. Preheating the vacuum chamber to high temperatures accelerates the release of adsorbed gases on all surfaces within the vacuum chamber. However, since the target source is equipped with enhanced water cooling conditions, the temperature of the target material is low, and the adsorbed gas cannot be released at an accelerated rate, which affects the acquisition of high background vacuum and low pressure rise rate, resulting in residual gas (mainly water vapor) in the vacuum chamber. ) have a significa...

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Problems solved by technology

However, since the target source is equipped with enhanced water cooling conditions, the temperature of the target material is low, and the adsorbed gas cannot be released at an accelerated rate, which affects the acquisition of high background vacuum and low pressure rise rate, resulting in residual gas (mainly water vapor) in the vacuum chamber. ) have a significant negative impact on the quality of the nitride coating

[0005] (2) Contamination of CAE target surface

It is almost impossible to achieve in a vacuum chamber environment, and the surface of the target source will still be contaminated;

[0013] 3) When the source baffle is closed, the target source discharge is started (cleaning the surface of the target), and the source baffle will be bombarded and heated by intense plasma discharge, which cannot be tolerated by general source baffles;

[0014] 4) When the source baffle is opened, it will occupy the coating area in the vacuum chamber, reducing the valuable loading space and workpiece loading capacity of the coating machine

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