Interlayer interconnection technology
A technology of interlayer interconnection and process, applied in the direction of circuit lamination, electrical connection formation of printed components, electrical components, etc., can solve the problems of complex process and product expansion and contraction, and achieve the effect of simple steps and avoiding expansion and contraction
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[0015] combined with figure 1 , to further describe the present invention:
[0016] An interlayer interconnection process mentioned in the present invention adopts the following steps:
[0017] a. It is to roughen the copper surface;
[0018] b. Use wire bonding equipment to make gold bumps on the copper surface that needs to be interconnected. The height of the gold bumps is 50~70um;
[0019] c. It is the covering glue layer, the glue thickness is 25um; the adhesive glue layer used can be any one of epoxy resin glue, acrylic glue or liquid crystal polymer glue.
[0020] d. The copper on the other side is thermally bonded to its opposite position at a temperature of 140 degrees for 4 hours to complete the interlayer interconnection.
[0021] The invention has the advantages of solving the problems in the prior art that the process is complicated and that the wet process has a great influence on the expansion and contraction of the product. The dry process is adopted in the ...
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