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A process that can realize effective cleaning of single crystal pot bottom material

A single crystal and process technology, applied in the direction of inorganic chemistry, non-metallic elements, silicon compounds, etc., can solve the problems of difficult separation of impurities, high utilization cost, and difficulty in repeated utilization, and achieve the effect of reducing utilization cost

Active Publication Date: 2018-05-29
DALIAN UNIV OF TECH QINGDAO NEW ENERGY MATERIALS TECH RES INST CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] The monocrystalline pot bottom material produced by compound pulling monocrystalline silicon rods in the industry is difficult to be reused due to the large amount of impurities such as crucibles adhering to its surface, so it can only be sorted by manual selection or soaked in HF. Cleaning by means of cleaning, which makes the sales value of this raw material low but the utilization cost is high
Therefore, there are a large number of such silicon materials in the market that are difficult to reuse, and a low-cost and convenient method of processing silicon materials has become an inevitable demand.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] A process capable of effectively cleaning single crystal pot bottom materials, comprising the following steps:

[0023] (1) Pour 50kg of bulk monocrystalline pot bottom material into the drum, accounting for about 1 / 4-1 / 3 of the volume of the drum;

[0024] (2) Put the loaded cylinder into a caustic soda solution (35° C.) with a mass fraction of 15%, and stop after rolling and cleaning for 40 minutes;

[0025] (3) Rinse the alkali-washed silicon material with clean water and put it into an acid solution for rolling cleaning for 10 minutes (the acid solution is a mixed acid of hydrochloric acid and hydrofluoric acid, and the volume ratio is HF:HCl:water=1:1:2 );

[0026] (4) Take out the silicon material after pickling with three clean water rolls for 3 minutes each, so as to clean off the acid solution;

[0027] (5) Sorting the silicon material, sieving the silicon material and massive impurities obtained by corrosion and collision separation through the acid-base cle...

Embodiment 2

[0031] A process capable of effectively cleaning single crystal pot bottom materials, comprising the following steps:

[0032] (1) Pour 80kg of bulk monocrystalline pot bottom material into the drum, accounting for about 1 / 4-1 / 3 of the volume of the drum;

[0033] (2) Put the loaded drum into a caustic soda solution (40° C.) with a mass fraction of 20%, and stop after rolling and cleaning for 50 minutes;

[0034] (3) Rinse the alkali-washed silicon material with clean water and put it into the acid solution for rolling cleaning for 20 minutes (the acid solution is a mixed acid of hydrochloric acid and hydrofluoric acid, and the volume ratio is HF:HCl:water=1:1:2 );

[0035] (4) Take out the silicon material after pickling by rolling and washing with three clean waters for 5 minutes each, so as to clean out the acid solution;

[0036] (5) Sorting the silicon material, screening the silicon material and massive impurities obtained through the acid-base cleaning process through...

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Abstract

The invention belongs to the technical filed of silicon material recovery processing, and specifically relates to technology for effectively cleaning monocrystal pot scrap. The technology comprises the following steps: (1) pouring block monocrystal pot scrap in a roller; (2) putting the charged roller in a caustic soda solution for rolling cleaning; (3) washing the silicon material subjected to alkali cleaning with water and putting the obtained silicon material in an acid solution for rolling cleaning; (4) washing the silicon material subjected to acid cleaning with water for several times and taking the obtained silicon material out; (5) sorting the obtained silicon material and picking block impurities out; and (6) performing ultrasonic cleaning with pure water to the sorted silicon material, and performing drying and packaging. The manner of cleaning the silicon material and the acid and alkali cleaning time can be controlled, so that non-silicon impurities such as refractory crucible attached to an external surface of complex pull monocrystal pot scrap can be effectively cleaned. The silicon material can be reused, and the using cost of the monocrystal pot scrap can be effectively reduced.

Description

technical field [0001] The invention belongs to the technical field of silicon material recovery and treatment, and in particular relates to a process capable of realizing effective cleaning of single crystal pot bottom material. Background technique [0002] The monocrystalline pot bottom material produced by compound pulling monocrystalline silicon rods in the industry is difficult to be reused due to the large amount of impurities such as crucibles adhering to its surface, so it can only be sorted by manual selection or soaked in HF. The method of cleaning, which makes the sales value of this raw material is low but the utilization cost is very high. Therefore, it is difficult to reuse a large amount of such silicon materials in the market, and a low-cost and convenient silicon material processing method has become an inevitable demand. Contents of the invention [0003] In order to solve the above-mentioned problems in the prior art, the present invention provides a p...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B33/037
CPCC01B33/037C01P2006/80
Inventor 李鹏廷王峰张建帅姚玉杰
Owner DALIAN UNIV OF TECH QINGDAO NEW ENERGY MATERIALS TECH RES INST CO LTD