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Coating method, etching method and coating equipment for metal strip for etching

A metal strip and etching technology, applied in the field of etching, can solve the problems of high cost, security threats, and high labor costs, and achieve the effects of compressing processing cycles, saving labor, and improving reliability.

Active Publication Date: 2019-02-05
深圳臻金精密科技有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0023] The purpose of the present invention is to provide a coating method, etching method and equipment for metal strips used for etching, aiming at solving the problems of high cost, safety threats, High labor costs and other issues

Method used

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  • Coating method, etching method and coating equipment for metal strip for etching
  • Coating method, etching method and coating equipment for metal strip for etching
  • Coating method, etching method and coating equipment for metal strip for etching

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Embodiment Construction

[0045] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0046] It should be noted that when an element is referred to as being “fixed on” or “disposed on” another element, it may be directly on the other element or there may be an intervening element at the same time. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or intervening elements may also be present.

[0047] It should also be noted that the orientation terms such as left, right, up, and down in this embodiment are only relative concepts or refer to the normal use state of the product, and should not be regarded as limiti...

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Abstract

The invention relates to an etching technology and provides a film covering method of metal strip for etching, an etching method and film covering equipment. The film covering method comprises steps of film covering, first die cutting, first demoulding, second film covering, second die cutting, third film covering, fourth film covering and second demoulding. The film covering equipment comprises a first film covering device, a first die cutting device, a first demoulding device, a second film covering device, a second die cutting device, a third film covering device, a fourth film covering device and a second demoulding device sequentially arranged and enabling metal strip to continuously move. According to the invention, the following steps are finished in sequence: the metal strip is coated with an adhesive film, the adhesive film on an etching area of the metal strip can be mechanically removed, a non-etching area is protected, and the etching area is in direct contact with etching liquid, so that labor force is saved, the processing cycle is shortened, proportion of a chemical reagent is reduced, requirements for the environment and the raw material are lowered, reliability of the non-etching area is improved, and the production efficiency is greatly improved.

Description

technical field [0001] The present invention relates to etching technology, more specifically, relates to a method for coating a metal strip used for etching, an etching method and coating equipment. Background technique [0002] Etching, also known as photochemical etching, refers to removing the protective film of the area to be etched after exposure plate making and development, and contacting chemical solutions during etching to achieve the effect of dissolution and corrosion, forming concave-convex or hollow-out molding effects. Etching can be used to make printing concave-convex plates such as copper plates and zinc plates at the earliest, and is widely used in the processing of weight-reducing instrument panels, nameplates, and thin workpieces that are difficult to process by traditional processing methods; after continuous improvement and development of process equipment, it can also be used It is used in the processing of precision etching products of thin electroni...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23F1/02B32B37/10
Inventor 毛海涛
Owner 深圳臻金精密科技有限公司
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