Automated program correctness management method and device for sen ion implantation machine

A technology for ion implantation and management devices, applied in error detection/correction, electrical digital data processing, instruments, etc., can solve the problems of numerous ion implantation program parameters and complicated machine software, and achieve the effect of saving manpower and avoiding losses

Active Publication Date: 2019-01-04
SHANGHAI HUALI MICROELECTRONICS CORP
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the large number of ion implantation program parameters and the complexity of the machine software, it is difficult for engineers to detect errors 100% during re-inspection.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Automated program correctness management method and device for sen ion implantation machine
  • Automated program correctness management method and device for sen ion implantation machine
  • Automated program correctness management method and device for sen ion implantation machine

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0047] The implementation of the present invention is described below through specific examples and in conjunction with the accompanying drawings, and those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific examples, and various modifications and changes can be made to the details in this specification based on different viewpoints and applications without departing from the spirit of the present invention.

[0048] figure 1 It is a system architecture diagram of an automatic program correctness management device for a SEN ion implantation machine according to the present invention. Such as figure 1 As shown, an automatic program correctness management device for a SEN ion implantation machine in the present invention includes: a receiving unit 101 , a request download unit 102 , a parameter co...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses an automation program correctness management device and an automation program correctness management method for a SEN ion-implantation machine table. The method comprises the steps of: receiving a selection operation of a user and selecting a target machine table server; after receiving the selection operation of the user, downloading to-be-checked programs from the target machine table server according to the selection operation of the user; collecting the to-be-checked parameters for each program by using a missile attack method and generating a to-be-checked parameter report; and carrying out correctness checking on the programs and the to-be-checked parameters and outputting a checking result. According to the device and the method, the correctness checking can be automatically carried out on the programs of the SEN machine table, not only the manpower for manual checking is saved but also a program error can be absolutely checked and the loss caused by the program error is avoided.

Description

technical field [0001] The invention relates to the field of semiconductor device manufacturing, in particular to an automatic program correctness management method and device for a SEN ion implantation machine. Background technique [0002] At present, in the chip manufacturing process, ion implantation is a very important process link. However, this process cannot be monitored online by means of film thickness and critical dimensions like other processes. Once the program is wrong, it will not be discovered until the electrical test, which will cause heavy losses. Therefore, the common practice in the industry is to arrange for engineers to recheck the program after the program is created, so as to correct the program errors before using the program. However, due to the large number of parameters in the ion implantation program and the complexity of the machine software, it is difficult for engineers to detect errors 100% during re-inspection. Contents of the invention ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G06F11/36
CPCG06F11/3604
Inventor 孙天拓戴树刚胡荣
Owner SHANGHAI HUALI MICROELECTRONICS CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap