A method for repairing uranium-polluted water bodies with imprinted materials prepared with facultative marine fungi as a substrate and phytic acid as a functional monomer
A technology of imprinted materials and functional monomers, which is applied in the field of repairing uranium-contaminated water bodies with imprinted materials prepared with facultative marine fungi as the substrate and phytic acid as the functional monomer, achieving high recognition ability, no secondary pollution, and simple steps Effect
Inactive Publication Date: 2017-09-01
NANHUA UNIV
View PDF5 Cites 0 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
This patent is based on an endogenous fungus Fusarium sp. #ZZF51 is the substrate, phytic acid is the functional monomer, UO 2 2+ As a template ion, tetraethoxysilane (TEOS) is used as a cross-linking agent, and the method of preparing uranium (VI) ion imprinted materials by sol-gel technology to repair uranium (VI) polluted water bodies has not been reported in the literature so far.
(2) Most of the microorganisms previously used to remediate uranium (VI) polluted water come from land, but there are few reports on microorganisms from marine sources (including mangrove sources)
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment 1
[0040] To the pH value of 5.0, the content of uranium (VI) is 40 mg•L -1 20 mg of fungal imprinted material was put into 50 mL of polluted water, stirred magnetically at room temperature for 60 min (150 rpm), filtered, and the content of uranium (VI) in the water was detected. The removal rate and adsorption capacity of uranium (VI) were calculated as 95.91% and 95.91 mg·g -1 .
Embodiment 2
[0042] To pH 6.0, the content of uranium (VI) is 50 mg•L -1 20 mg of fungal imprinted material was put into 50 mL of polluted water, stirred magnetically at room temperature for 60 min (150 rpm), filtered, and the content of uranium (VI) in the water was detected. The removal rate and adsorption capacity of uranium (VI) were calculated as 94.28% and 117.85 mg·g -1 .
Embodiment 3
[0044] To the pH value of 7.0, the content of uranium (VI) is 50 mg•L -1 20 mg of fungal imprinted material was put into 50 mL of polluted water, stirred magnetically at room temperature for 50 min (150 rpm), filtered, and the content of uranium (VI) in the water was detected. The removal rate and adsorption capacity of uranium (VI) were calculated as 89.06% and 111.33 mg·g -1 .
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More Abstract
The invention relates to a method for remediating uranium contaminated water with an imprinted fungal material having high affinity and high recognition capability to uranyl ions. An uranium ion imprinted material is prepared by means of the sol-gel technique from a typical facultative marine mangrove endophytic fungus Fusarium sp.#ZZF51 as a matrix, phytic acid as a functional monomer, UO2<2+> as a template ion, and tetraethoxysilane (TEOS) as a cross-linking agent; then, the obtained material is thrown in uranium contaminated water to remediate the uranium contaminated water; and after a period of time, the material is retrieved and subjected to centralized treatment. The material proposed provided by the invention has high affinity and high recognition capability to uranyl ions, and may lead to a removal rate of uranyl ions of 90% or above 50-70 min later after being thrown in water. The imprinted fungal material is in the form of spherical granules, and is low in cost, high in remediation efficiency, environmentally friendly without secondary pollution, and relatively simple and convenient in retrieval and centralized treatment.
Description
technical field [0001] The invention relates to the technical field of restoration of uranium (VI) polluted water bodies, and is a kind of endogenous fungus based on mangroves Fusarium sp. #ZZF51 (a typical facultative marine radiation-resistant fungus, which can produce and sporulate in freshwater, terrestrial and marine environments) as substrate, phytic acid as functional monomer, UO 2 2+ As the template ion, tetraethoxysilane (TEOS) is used as the cross-linking agent, and the sol-gel technology is used to prepare imprinted materials to quickly remove uranium (VI) pollution in water. Background technique [0002] Uranium is a kind of radioactive substance and an important energy substance. Most of it is uranyl ion (UO 2 2+ ) form exists. With the rapid development of the nuclear industry and the decommissioning of waste nuclear facilities, some uranium (VI)-containing wastewater has brought serious harm to the environment and human beings. Uranium (VI) is usually ac...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More Patent Type & Authority Patents(China)
IPC IPC(8): G21F9/18B01J20/26B01J20/30
CPCB01J20/268B01J2220/4868G21F9/18
Inventor 谭倪侯丹廖森杨雪纯高阳王娟聂长明颜雪明武亚新蒋敏何典雄
Owner NANHUA UNIV