A self-rotating cleaning robot system for end faces

Abstract

The embodiment of the invention provides a cleaning manipulator system with a self-rotation end face. The cleaning manipulator system comprises a manipulator and a cleaning hairbrush. The manipulator comprises a stand column, a swing arm, an end face rotary mechanism and a wafer adsorption mechanism. The end face rotary mechanism mainly comprises a motor, a bearing, a swing arm upper disc and a swing arm lower disc. The motor drives the swing arm upper disc and the swing arm lower disc which are mounted on the bearing to rotate so as to drive the end face, making contact with wafers, of the wafer adsorption mechanism fixed to the lower portion of the swing arm lower disc to rotate. Cleaning is achieved when the manipulator moves to the cleaning hairbrush. According to the cleaning manipulator system, cleaning is conducted through self-rotation of the end face of the manipulator, the hairbrush does not need to rotate, the mounting space of the cleaning hairbrush can be effectively saved, the structure of the cleaning hairbrush is simplified, the overall structure of the manipulator is made simpler, acting is easier and more convenient, and the stability is improved.

Description

technical field [0001] The invention belongs to the technical field of semiconductor device processing, and relates to a manipulator used in semiconductor device processing, in particular to a manipulator system capable of self-rotating cleaning of end faces. Background technique [0002] When using dedicated processing equipment to process semiconductor devices, it is necessary to transport the device to be processed to the processing location. Taking wafer processing as an example, the transfer operation is usually performed by a manipulator holding the wafer. However, during the transfer process, the manipulator will be in direct contact with the wafer to be processed. If the manipulator is not cleaned cleanly, it will easily cause contamination of the wafer, and even damage the subsequent order of the wafer. The processing procedure is invalid, so the cleaning of the transfer robot is an indispensable step in the wafer processing process. [0003] At present, in semicon...

AI Technical Summary

Problems solved by technology

However, the above cleaning method requires additional space for installing the rotating brush, and it is difficult to implement in some places where the installation space is small, and the processing of the rotating brush is difficult and costly

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