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Nanofabrication using a new class of electron beam-induced surface treatments

A technology of electron beams and charged particle beams, which is applied to circuits, discharge tubes, electrical components, etc., and can solve problems such as application restrictions

Active Publication Date: 2020-07-07
FEI CO
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Djenizian's method is limited in application for the same reasons as Mackus above

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  • Nanofabrication using a new class of electron beam-induced surface treatments
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  • Nanofabrication using a new class of electron beam-induced surface treatments

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Embodiment Construction

[0037] Described below are several techniques for defining nanoscale regions of altered surface chemistry (SC) on oxide or noble metal substrates using electron beam induced chemical reactions. Some of the described systems enable an increase in ultimate resolution capability and ease of fabrication at high resolutions of EBL-based nanofabrication techniques, as well as a reduction in the number of processing steps required.

[0038] Figure 1A is a flowchart of a generalized procedure for performing a method according to some embodiments. Figure 1B is shown for Figure 1A Flowchart of some examples of block replacement techniques. Referring to the two figures, generally presented are processing schemes for nanoscale surface chemistry-based direct electron beam lithography (SCDEBL). The protocol preferably consists of three main processing steps and employs electron beam-induced surface reactions between gaseous precursor molecules and specific substrate surfaces. This me...

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Abstract

The present invention relates to nanofabrication using a new class of electron beam induced surface treatment techniques. Methods and systems are described for direct lithographic pattern definition based on electron beam-induced changes in the surface chemistry of a substrate. The method involves an initial chemical treatment for globally defining a specified surface chemistry (SC). An electron beam-induced surface reaction between the gaseous precursor and the surface is then used to locally alter the SC. As a result, a stable high-resolution patterning of the specified surface chemistry on the substrate can be achieved. The defined patterns can then be used for selective material deposition via specific methods using specific SC combinations or by surface energy differences. It is possible to perform all steps in situ without breaking the vacuum.

Description

technical field [0001] The present invention relates to improved electron beam processing techniques, and more particularly to improved techniques for fabrication at nanoscale resolution. Background technique [0002] Electron Beam Induced Deposition (EBID) is a technique used to deposit materials on the surface of a substrate. EBID deposits material on a substrate surface through the interaction of an electron beam and a deposition precursor. Typically, the precursor is a gas and the material to be deposited is a metal. [0003] Electron Beam Induced Etching (EBIE) is another technique used for substrate surface modification. In EBIE, an electron beam induces etching in the irradiated region, usually assisted by an etching precursor gas. [0004] E-beam-induced deposition is attractive because it enables direct-write nanofabrication and high-resolution visual feedback in scanning electron microscopy (SEM). However, the application of EBID is currently limited. [0005]...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/02C23C16/04
CPCC23C16/0227C23C16/0236C23C16/047H01J37/3174H01J37/3178H01J2237/31732H01J2237/31754H01J2237/31796C23C16/487
Inventor J.比肖普T.T.特兰I.阿哈罗诺维奇C.罗波M.托思
Owner FEI CO