Kelvin probe force microscope synchronously measuring multiple parameters
A Kelvin probe force and synchronous measurement technology, applied in scanning probe microscopy, measuring devices, scanning probe technology, etc. Synchronous characterization and other issues to achieve high practical value, high availability and operability, and the effect of compensating errors
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specific Embodiment approach 1
[0020] Specific implementation mode one: combine figure 1 Describe this embodiment mode, a Kelvin probe force microscope for multi-parameter synchronous measurement described in this embodiment mode, including XY micron positioning stage 12, XYZ nanometer positioning stage 13, Kelvin scanning sample stage 15, XYZ micron positioning stage 8, a Dimension range adjustment micro-platform 10, probe hand bracket 9, probe hand 7, host computer, DC power supply, arbitrary wave generator, acquisition card, signal generator, phase shifter, lock-in amplifier, four-quadrant position detector , semiconductor laser generator, piezoelectric controller No. 1, piezoelectric controller No. 2 and piezoelectric controller No. 3;
[0021] The Kelvin scanning sample stage 15 is fixed on the XYZ nanopositioning stage 13, and the XYZ nanopositioning stage 13 is fixed on the XY micron positioning stage 12; the probe hand 7 is equipped with a conductive probe 7-4 and can drive the conductive probe 7-4 ...
specific Embodiment approach 2
[0054] Specific implementation mode two: combination figure 1 with figure 2 Describe this embodiment. This embodiment is a further limitation of the Kelvin probe force microscope described in Embodiment 1. In this embodiment, a measurement module implemented by software is embedded in the host computer, and the measurement module includes the following units :
[0055] Force detection unit: collect the deformation of the conductive probe 7-4 detected by the four-quadrant position detector 4 in real time, and calculate the force between the conductive probe 7-4 and the sample according to the deformation; the force is equal to The product of the deformation amount and the stiffness of the conductive probe 7-4;
[0056] Surface topography and maximum indentation depth measurement unit: Control the Kelvin scanning sample stage 15 to rise through the No. 1 piezoelectric controller, so that the sample is close to the conductive probe 7-4, when the maximum interaction between the...
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