Unlock instant, AI-driven research and patent intelligence for your innovation.

reaction chamber

A technology of reaction chamber and base, applied in the field of reaction chamber, can solve the problem of inability to accurately and timely judge whether there is a tray in the reaction chamber, and achieve the effect of improving reliability

Active Publication Date: 2019-03-12
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
View PDF7 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The present invention aims to solve at least one of the technical problems existing in the prior art, and proposes a reaction chamber, which can avoid situations such as sudden failure or abnormality of the software system, which cannot accurately and timely determine whether there is a pallet case, which can improve the reliability of the equipment

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • reaction chamber
  • reaction chamber
  • reaction chamber

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0022] In order to enable those skilled in the art to better understand the technical solution of the present invention, the reaction chamber provided by the present invention will be described in detail below with reference to the accompanying drawings.

[0023] The reaction chamber provided by the present invention includes a base and a workpiece detection device, wherein the base is arranged inside the reaction chamber and includes a carrying surface for carrying a tray, the tray is used for carrying at least one processed workpiece, the processed The workpiece is such as a wafer which is a sapphire substrate, a silicon substrate, or the like. The diameter of the wafer is generally not less than 2 inches, such as 2 inches, 4 inches or 8 inches. The workpiece detection device is used to detect whether a pallet is placed on the base, and sends out a digital signal (ie, DI signal) about yes or no. The so-called digital signal refers to the signal in which the independent vari...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a reaction cavity. The reaction cavity comprises a base and a workpiece detection device. The base comprises a bearing face used for bearing a tray. The tray is used for bearing at least one machined workpiece. The workpiece detection device is used for detecting whether the tray is placed on the base or not and sending out digital signals related to yes or no. According to the provided reaction cavity, whether the tray is placed on the base or not can be judged by directly reading the digital signals, accordingly even when the situations of sudden faults or abnormality or the like of a software system happen, whether the tray exists in the reaction cavity or not can still be accurately judged in time, and accordingly equipment reliability can be improved.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a reaction chamber. Background technique [0002] In the semiconductor manufacturing process, it is usually necessary to use a robot to transfer the tray carrying the substrate between the loading chamber and the reaction chamber. This transfer process involves a large number of interlocks, and the main purpose is to protect the safety of personnel and equipment. Before the manipulator transfers the tray into the reaction chamber, it is not only necessary to judge whether the manipulator has successfully picked up the film, and whether there is a tray on the manipulator, but also whether there is a tray in the reaction chamber. The current semiconductor processing equipment mainly relies on the records of the software system. Determine if there is a tray in the reaction chamber. [0003] figure 1 It is a flow chart of the transfer of existing semiconductor processing ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/52H01L21/02
CPCC23C16/52H01L21/02104
Inventor 陈庆
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD