Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Broad-band high-diffraction-efficiency asymmetric morphology reflection grating

A diffraction-efficient, asymmetric technology, applied in the directions of diffraction gratings, optics, optical components, etc., to achieve the effect of simple grating structure

Inactive Publication Date: 2017-05-31
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
View PDF6 Cites 15 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] At present, most of the grating ridges of the common reflective gratings are rectangular or isosceles trapezoidal. As far as we know, no one has provided a broadband high diffraction efficiency design for reflective gratings with asymmetrical shapes.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Broad-band high-diffraction-efficiency asymmetric morphology reflection grating
  • Broad-band high-diffraction-efficiency asymmetric morphology reflection grating
  • Broad-band high-diffraction-efficiency asymmetric morphology reflection grating

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] Broadband high diffraction efficiency asymmetric topography reflective gratings, such as figure 1 As shown, the grating consists of a top grating ridge structure 3, a middle high-reflectivity film layer 7 and a bottom substrate. The top grating ridge structure has an asymmetric shape, and the corresponding bottom angles α and β are 68° and 89°. The film structure of the grating is S|(HL) 15 RG|A, where S represents the substrate, H represents the high refractive index film layer 6 (Ta 2 o 5 ), L represents the low refractive index film layer 5 (SiO 2 ), the film period is 15 periods, and R represents the remaining dielectric layer of the grating with a thickness of 256 nm (HfO 2 ), G represents the grating ridge structure layer with a height of 400 nm (HfO 2 ), A means air. The period of the grating is 833 nanometers, the corresponding grating line density is 1200 lines per millimeter, and the bottom occupation ratio f is 0.66. Such as image 3 As shown, when th...

Embodiment 2

[0031] Broadband high diffraction efficiency asymmetric topography reflective gratings, such as figure 2 As shown, the grating structure is composed of the top grating ridge structure 3, the middle high-reflectivity film layer 7 and the bottom substrate, wherein the top grating ridge structure has an asymmetric shape, and the corresponding base angles α and β are 68° and 89° respectively . The film structure of the grating is S|MRG|A, where S represents the substrate, M represents the high-reflectivity metal layer (Au) with a thickness of 200 nm, and R represents the remaining dielectric layer (HfO) with a thickness of 168 nm. 2 ), G represents the grating ridge structure layer with a height of 567 nm (HfO 2 ), A means air. The period of the grating is 683 nanometers, the corresponding grating line density is 1464 lines per millimeter, and the grating duty ratio is 0.6. Such as Figure 5 It is shown that when the incident light is incident at the Littrow angle, in the ran...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a broad-band high-diffraction-efficiency asymmetric morphology reflection grating which is characterized in that a grating structure is formed by a top grating ridge structure, an intermediate high-reflectivity film layer and a bottom substrate, wherein the top grating ridge structure has asymmetric morphology, and base angles alpha and beta of the quadrangle in the asymmetric morphology are not equal. According to the asymmetric morphology reflection grating, when the incident angle is (-1) grade Littrow angle, (-1) grade diffraction efficiency which is higher than 95 percent can be obtained in a 80nm bandwidth range, the highest diffraction efficiency in the wave band is more than 99 percent, and the (-1) grade diffraction efficiency higher than 95 percent can be obtained in a wider angular spectrum, so that the grating can work in wider bandwidth and wider incident angle range. The broad-band high-diffraction-efficiency asymmetric morphology reflection grating has excellent performance and simple structure, is applicable to large-scale production, and has important application prospects in the field of high power laser.

Description

technical field [0001] The invention relates to a reflective grating, in particular to a wide-band, high-diffraction-efficiency, asymmetrical-shaped reflective grating. Background technique [0002] In the field of high-power lasers, reflective gratings, as the main dispersion components, play a central role in spectrum synthesis technology and laser pulse width compression technology. Compared with reflective gratings, transmissive gratings are also not suitable for high-energy laser systems because the energy needs to pass through the interior of the grating. Therefore, research on reflective gratings is of great significance in the field of high-power lasers. At present, it is still a difficult problem in the design and manufacture to have high diffraction efficiency and high resistance to laser damage threshold, and its development has great research prospects and practical significance. [0003] -1-level high-efficiency gratings usually require a higher density grating...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/18
CPCG02B5/1809G02B5/1861
Inventor 晋云霞陈俊明邵建达孔钒宇黄昊鹏陈鹏王磊磊李林欣徐姣
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
Features
  • Generate Ideas
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More