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Method for preparing non-evaporable thin film getter

A getter and non-evaporable technology, which is applied in the field of preparing non-evaporable film getters, can solve the problems of increasing workload and cost, and achieve the effect of saving preparation cost and time

Active Publication Date: 2017-06-13
苏州厚朴传感科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

These methods increase the workload and cost, and the uniformity and particle size of the alloy need to be controlled well

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0041] This embodiment is used to prepare getter metals that are titanium, zirconium and vanadium, and the atomic fraction percentage of titanium, zirconium and vanadium is 40%: 30%: 30%. The thickness percentage is 38.74%: 38.45%: 22.81%, and the preset ratio of evaporation rates of titanium, zirconium and vanadium is 3.874: 3.845: 2.281.

[0042] A method for preparing non-evaporable thin film getter, comprising the following steps:

[0043] S1. Put titanium, zirconium and vanadium getter metals one by one in the three evaporation boats of the coating machine as targets. The working parameters of each evaporation boat are individually controllable, and each evaporation boat is equipped with a film one by one. A thickness monitor to monitor the evaporation rate of the getter metal in the corresponding evaporation boat;

[0044] S2. Put the substrate and the evaporation boat into the vacuum chamber of the coating machine;

[0045] S3, vacuumize the vacuum cavity;

[0046] S...

Embodiment 2

[0049] This embodiment is used to prepare getter metals that are zirconium, vanadium, and iron, and the atomic fraction percentages of zirconium, vanadium, and iron are 57%: 36%: 7%. The thickness percentage is 69.60%: 26.08%: 4.32%, then the preset ratio of evaporation rates of zirconium, vanadium and iron is 6.960: 2.608: 0.432.

[0050] A method for preparing non-evaporable thin film getter, comprising the following steps:

[0051] S1. Place the three getter metals of zirconium, vanadium and iron one by one in the three evaporation boats of the coating machine as targets. The working parameters of each evaporation boat are individually controllable, and each evaporation boat is equipped with a film corresponding to one by one. A thickness monitor to monitor the evaporation rate of the getter metal in the corresponding evaporation boat;

[0052] S2. Put the substrate and the evaporation boat into the vacuum chamber of the coating machine;

[0053] S3, vacuumize the vacuum ...

Embodiment 3

[0057]This example is used to prepare a getter in which the getter metals are zirconium and aluminum, and the atomic fraction percentages of zirconium and aluminum are 60%: 40%. According to calculation, the thickness percentages of zirconium and aluminum are 67.84%: 32.16%. Then the preset ratio of evaporation rate of zirconium and aluminum is 6.784:3.216.

[0058] A method for preparing non-evaporable thin film getter, comprising the following steps:

[0059] S1. Place zirconium and aluminum getter metals one by one in the two evaporation boats of the coating machine as targets. The working parameters of each evaporation boat are individually controllable, and each evaporation boat is equipped with film thickness monitoring correspondingly. instrument to monitor the evaporation rate of the getter metal in the corresponding evaporation boat;

[0060] S2. Put the substrate and the evaporation boat into the vacuum chamber of the coating machine;

[0061] S3, vacuumize the vac...

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PUM

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Abstract

The invention discloses a method for preparing a non-evaporable thin film getter. The method comprises the steps that a plurality of gettering metals are placed in a plurality of evaporation boats of a coating machine in a one-to-one correspondence mode to serve as target materials, the kind of the gettering metals is at least two, the working parameters of each evaporation boat are separate and controllable, and film thickness monitors are arranged on all the evaporation boats in a one-to-one correspondence mode so that the evaporation rates of the gettering metals in the corresponding evaporation boats can be monitored; substrates and the evaporation boats are put into a vacuum cavity of the coating machine; the interior of the vacuum cavity is vacuumized; the gettering metals are pre-molten, and the working parameters of all the evaporation boats are controlled, so that all the gettering metals are evaporated at the same time; and the working parameters of the evaporation boats are adjusted according to the feedback value of the film thickness monitors so that the evaporation rates of all the gettering metals can be adjusted into the preset ratio. According to the method for preparing the non-evaporable thin film getter, the various gettering metals can be evaporated at the same time, and alloy does not need to be manufactured additionally, so that the preparation cost of the getter is beneficially reduced, and the preparation time is beneficially saved; and meanwhile, the components of the getter can be precisely controlled by controlling the evaporation rates of all the gettering metals.

Description

technical field [0001] The invention relates to a method for preparing a thin film getter, in particular to a method for preparing a non-evaporable thin film getter. Background technique [0002] Getter, also known as getter, is a general term for a preparation or device that can effectively absorb certain gas molecules by using its own physical or chemical properties, and is used to obtain, maintain vacuum and purify gas. Getters are widely used in optoelectronic devices that require a vacuum environment, creating a good working environment for the device, stabilizing the characteristic parameters of the device, and having an important impact on the performance and service life of the device. [0003] Getters are generally divided into two categories: evaporative and non-evaporable. Among them, evaporable getters mainly absorb the residual active gas in vacuum devices through chemical reactions, and need to heat the getter metal to evaporate to form a getter film; The evap...

Claims

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Application Information

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IPC IPC(8): C23C14/24C23C14/14C23C14/54B01J20/02
CPCB01J20/0203B01J20/0214B01J20/0229B01J20/0248C23C14/14C23C14/24C23C14/546
Inventor 周东平
Owner 苏州厚朴传感科技有限公司
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