Bright etched frosted glass and preparation method thereof
A technology for frosted glass and glass products, applied in the field of light industry, can solve the problems of ineffective recovery of silicon tetrafluoride gas, difficult preparation of brightly etched frosted glass, etc., and achieves high yield, grainy and stable quality. Effect
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Embodiment 1
[0031] In this embodiment, a bright etched frosted glass has a reflectivity of about 80% and an etching layer thickness of about 200 nm. The preparation steps of bright etched frosted glass of the present embodiment are as follows:
[0032] 1) Glass cleaning and drying: Use industrial cleaning agent solution (5wt%) to clean the rectangular glass products to be etched with a length of 1m and a width of 1m, and then place the cleaned glass products to be etched at 60°C for drying dry, ready to use;
[0033] 2) Pretreatment: immerse the glass product to be etched obtained in step 1) in an aqueous solution of sodium hydroxide at a temperature of 60°C, the concentration of the aqueous solution of sodium hydroxide is 400g / L, and the immersion time is 30min. After the immersion is completed, take it out and wash it with water. Remove the aqueous sodium hydroxide solution on the surface of the glass product and dry it;
[0034] 3) Configuration of etching solution: Weigh and mix 5g ...
Embodiment 2
[0039] In this embodiment, a bright etched frosted glass has a light reflection rate of about 30% and an etching layer thickness of about 50 nm. The preparation steps of bright etched frosted glass of the present embodiment are as follows:
[0040] 1) Glass cleaning and drying: Use industrial cleaning agent solution (5wt%) to clean the rectangular glass products to be etched with a length of 1m and a width of 1m, and then place the cleaned glass products to be etched at 60°C for drying dry, ready to use;
[0041] 2) Pretreatment: immerse the glass product to be etched obtained in step 1) into an aqueous potassium hydroxide solution at a temperature of 50°C, the concentration of the aqueous potassium hydroxide solution is 150g / L, and the immersion time is 5min. After the immersion is completed, take it out and wash it with water. Remove the aqueous potassium hydroxide solution on the surface of the glass product and dry it;
[0042] 3) Configuration of etching solution: Weigh...
Embodiment 3
[0046] In this embodiment, a bright etched frosted glass has a light reflection rate of about 55% and an etching layer thickness of about 121 nm. The preparation steps of bright etched frosted glass of the present embodiment are as follows:
[0047] 1) Glass cleaning and drying: Use industrial cleaning agent solution (5wt%) to clean the rectangular glass products to be etched with a length of 1m and a width of 1m, and then place the cleaned glass products to be etched at 60°C for drying dry, ready to use;
[0048] 2) Pretreatment: immerse the glass product to be etched obtained in step 1) into an aqueous potassium hydroxide solution at a temperature of 55°C, the concentration of the aqueous potassium hydroxide solution is 250g / L, and the immersion time is 15min. After the immersion is complete, take it out and wash it with water. Remove the aqueous potassium hydroxide solution on the surface of the glass product and dry it;
[0049] 3) Configuration of etching solution: Weig...
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Abstract
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