A kind of preparation method of dustproof surface

A dust-proof and plasma technology, applied in the field of ion chemical vapor deposition, can solve the problems of poor substrate bonding, difficult coating preparation, high cost, etc., and achieve good weather resistance, excellent physical and electrical properties.

Active Publication Date: 2018-04-27
JIANGSU FAVORED NANOTECHNOLOGY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Difficulty in preparation of coatings in the prior art, selectivity to the substrate, poor bonding with the substrate, high cost and difficulty in large-scale application

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] A method for preparing a dust-proof surface, characterized in that it comprises the following steps:

[0043] (1) Place the substrate in the reaction chamber of the plasma chamber, continuously evacuate the reaction chamber, pump the vacuum in the reaction chamber to 10 millitorr, and feed inert gas;

[0044] In step (1), the base material is a solid material, and the solid material is a solar cell panel;

[0045] In step (1), the volume of the plasma chamber is 1000 L, and the temperature of the plasma chamber is controlled at 30° C.; the flow rate of the inert gas is 5 sccm, and the inert gas is argon.

[0046] (2) Introduce the monomer vapor to a vacuum of 30 mTorr, turn on the plasma discharge, the power of the plasma discharge is 2W, and the discharge time is 7200s, and chemical vapor deposition is carried out to prepare a dense coating; after the deposition of the dense coating is completed , adjust the power of the plasma discharge to be 160W, and the discharge ti...

Embodiment 2

[0057] The basic process steps of this embodiment are the same as those of Example 1, and the different process parameters are as follows:

[0058] 1. In step (1):

[0059] The vacuum degree in the reaction chamber is pumped to 40 millitorr, and an inert gas is introduced; the solid material is an LED display; the volume of the plasma chamber is 870L, and the temperature of the plasma chamber is controlled at 35°C; the flow rate of the inert gas is 15 sccm, the inert gas is helium.

[0060] 2. In step (2):

[0061] Introduce the monomer vapor to a vacuum of 80 millitorr, turn on the plasma discharge, the power of the plasma discharge is 25W, and the discharge time is 5800s, perform chemical vapor deposition to prepare a dense coating; after the dense coating is deposited, adjust the plasma The power of bulk discharge is 220W, and the discharge time is 780s;

[0062] The monomer vapor composition that passes into in the described step (2) is:

[0063] A mixture of three mon...

Embodiment 3

[0071] The basic process steps of this embodiment are the same as those of Example 1, and the different process parameters are as follows:

[0072] 1. In step (1):

[0073] The vacuum in the reaction chamber is pumped to 90 millitorr, and an inert gas is introduced; the solid material is a glass product; the volume of the plasma chamber is 680L, and the temperature of the plasma chamber is controlled at 40°C; the flow rate of the inert gas is 50 sccm , the inert gas is a mixture of helium and argon.

[0074] 2. In step (2):

[0075] Introduce the monomer vapor to a vacuum of 160 mTorr, turn on the plasma discharge, the power of the plasma discharge is 60W, and the discharge time is 4500s, perform chemical vapor deposition to prepare a dense coating; after the dense coating is deposited, adjust the plasma The power of bulk discharge is 300W, and the discharge time is 650s;

[0076] The monomer vapor composition that passes into in the described step (2) is:

[0077] A mixtu...

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Abstract

A method for preparing a dustproof surface, comprising the following steps: (1) placing a substrate in a reaction cavity of a plasma chamber, continuously vacuumizing the reaction cavity till the vacuum degree in the reaction cavity reaches 10-200 millitorr, and introducing an inert gas or nitrogen; (2) introducing monomer vapor till the vacuum degree reaches 30-300 millitorr, enabling plasma discharge, the plasma discharge power being 2-150 W and the discharge time being 600-7,200 s, and performing chemical vapor deposition to prepare a compact coating; after the deposition of the compact coating is completed, adjusting the plasma discharge power to 160-500 W and the discharge time to 60-1,000 s, and performing chemical vapor deposition to prepare a rough coating; and preparing, on the surface of the substrate, a dustproof surface with an inner layer being a compact coating and an outer layer being a rough coating, the component of the monomer vapor introduced in step (2) being a mixture of at least one monofunctional unsaturated fluorocarbon resin and at least one polyfunctional unsaturated hydrocarbon derivative, the mass fraction of the polyfunctional unsaturated hydrocarbon derivative in the monomer vapor being 10-80％; and (3) stopping the plasma discharge, stopping introducing the monomer vapor, continuously vacuumizing, after maintaining the vacuum degree of the reaction cavity at 10-200 millitorr, introducing air till the pressure reaches an atmospheric pressure, and then taking out the substrate.

Description

technical field [0001] The invention belongs to the technical field of plasma chemical vapor deposition, and in particular relates to a method for preparing a dustproof surface. Background technique [0002] Due to the high surface energy of the traditional solid surface, it is easy to absorb dust, and the surface energy of the surface tends to be lowered spontaneously. Dust not only affects the appearance of the surface of the material, but also affects the performance and service life of the components. For example, the surface of the lunar rover absorbs moon dust, which affects the lighting of the solar panels and affects the performance of the moving parts of the lunar rover. Solar panels, lighting glass, outdoor display screens, LED light boxes, etc. are very easy to absorb dust, which seriously affects the performance of lighting and light transmission. [0003] The existing dust-proof technology is mainly one is to use low surface energy fluororesin as the film-formi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/513
CPCC23C16/0263C23C16/45523C23C16/513C23C28/00
Inventor 宗坚
Owner JIANGSU FAVORED NANOTECHNOLOGY CO LTD
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