Apparatus and method for treatment of flexible substrates using electron beam

Abstract

According to the present disclosure, a charged particle device for treatment of a moveable substrate and a method for treatment of a moving substrate in a processing system are provided. The charged particle device includes a source for forming a beam of charged particles for treatment of the substrate moving along a transport direction and a beam displacement device for moving the beam of charged particles from a first beam trajectory to at least a second beam trajectory along the transport direction.

Description

technical field

[0001] The present disclosure relates to an apparatus and method for processing flexible substrates. In particular, the present disclosure relates to an apparatus and method for processing flexible substrates using electron beams to allow for more homogenous processing of the substrates. Background technique

[0002] Electron sources are known from various fields. For example, electron beams are used for material modification, surface charge accumulation, sample imaging, and the like.

[0003] In order to reduce cost of ownership, today's manufacturing processes for processing large area substrates or flexible substrates (webs) such as for the manufacture of large area foils, thin film solar cells, and the like have a tendency to increase overall processing rates. Furthermore, in order to increase the throughput of manufacturing equipment, the energy density provided by the source on the substrate, foil, thin layer, or flexible substrate may also be increas...

Examples

Embodiment Construction

[0023] Reference numerals will now be used in detail for various embodiments, one or more examples of which are depicted in each of the drawings. In the following description about the drawings, the same reference numerals denote the same elements. In general, only the differences of individual implementations are described. Each example is offered by way of explanation, not limitation. For example, features illustrated or described as part of one embodiment can be used on or combined with other embodiments to yield a still further embodiment. The present disclosure is intended to cover such modifications and variations.

[0024] Embodiments described herein relate to electron sources, particularly linear electron sources and methods of operating electron sources, which can be used in a variety of applications. According to embodiments herein, a beam of charged particles generated by an electron source can be displaced to improve today's methods of manufacturing substrates,...

technical field

[0001] The present disclosure relates to an apparatus and method for processing flexible substrates. In particular, the present disclosure relates to an apparatus and method for processing flexible substrates using electron beams to allow for more homogenous processing of the substrates. Background technique

[0002] Electron sources are known from various fields. For example, electron beams are used for material modification, surface charge accumulation, sample imaging, and the like.

[0003] In order to reduce cost of ownership, today's manufacturing processes for processing large area substrates or flexible substrates (webs) such as for the manufacture of large area foils, thin film solar cells, and the like have a tendency to increase overall processing rates. Furthermore, in order to increase the throughput of manufacturing equipment, the energy density provided by the source on the substrate, foil, thin layer, or flexible substrate may also be increas...

Examples

Embodiment Construction

[0023] Reference numerals will now be used in detail for various embodiments, one or more examples of which are depicted in each of the drawings. In the following description about the drawings, the same reference numerals denote the same elements. In general, only the differences of individual implementations are described. Each example is offered by way of explanation, not limitation. For example, features illustrated or described as part of one embodiment can be used on or combined with other embodiments to yield a still further embodiment. The present disclosure is intended to cover such modifications and variations.

[0024] Embodiments described herein relate to electron sources, particularly linear electron sources and methods of operating electron sources, which can be used in a variety of applications. According to embodiments herein, a beam of charged particles generated by an electron source can be displaced to improve today's methods of manufacturing substrates,...

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