Manufacturing method for magnetic recording medium and magnetic recording medium manufactured by said manufacturing method
A technology for magnetic recording media and manufacturing methods, applied in the field of manufacturing magnetic recording media and magnetic recording media manufactured by such manufacturing, capable of solving problems such as reduced reliability of magnetic recording devices
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0079] In Example 1, the relationship between the concentration of X in FePtX (X is Rh, Cu, or Ru) and Ku was investigated.
[0080] A chemically strengthened glass substrate (N-10 glass substrate manufactured by HOYA Corporation) having a smooth surface was cleaned to prepare a substrate 10 . The cleaned substrate 10 was introduced into an in-line sputtering apparatus. The Ta adhesion layer 20 with a film thickness of 5 nm was formed by DC magnetron sputtering using a pure Ta target in Ar gas at a pressure of 0.5 Pa. The substrate temperature at the time of forming the Ta adhesion layer was room temperature (25° C.). The sputtering power at the time of formation of the Ta adhesion layer was 100W.
[0081] Next, a Cr underlayer 30 having a film thickness of 20 nm was obtained by DC magnetron sputtering using a pure Cr target in Ar gas at a pressure of 0.5 Pa. The substrate temperature at the time of forming the Cr base layer 30 was room temperature (25° C.). The sputtering...
Embodiment 2
[0097] In Example 2, the relationship between the heating film-forming time of FePtX (X is Rh or Ru) and the diffusion distance and diffusion coefficient of component X was studied. In addition, Example 2 corresponds to the example of the manufacturing method of the magnetic recording medium which heats after forming a 1st magnetic layer and a 2nd magnetic layer.
[0098] Form Si substrate, SiO 2 , FePt (20nm), and FePtX (20nm) to obtain a magnetic recording medium. Film formation was performed at room temperature. Then, post-heat treatment was performed at the temperature and heating time shown in Table 4. X of FePtX is Rh and Ru. The content of Fe and Pt in FePtX is 50 atomic % for Fe and 40 atomic % for Pt. The addition amounts of Rh and Ru were each 10 atomic % (the addition amount of each element was based on the total atoms).
[0099] The concentration, diffusion distance, and diffusion coefficient of the additive material X were obtained in the following procedure....
Embodiment 3
[0117] Example 3 is an example of a method of manufacturing a magnetic recording medium in which a first magnetic layer and a second magnetic layer are formed after heating a substrate.
[0118] First, a substrate formed up to the seed layer was produced in the same manner as in Example 1. Next, in the case of forming a magnetic recording layer in which the Rh composition of FePtRh is inclined, the substrate formed up to the seed layer is heated to a predetermined temperature in a heating chamber. The predetermined temperature is a numerical value determined experimentally from the temperature to be kept during film formation as described later. Then, 2 nm of FePt (Fe addition amount: 55 atomic %, Pt addition amount: 45 atomic % (the addition amount of each element is based on the total atoms)) was formed in the next film-forming chamber. Next, the substrate is moved to the next chamber, and FePtRh (addition amount of Fe: 50 atomic %, addition amount of Pt: 40 atomic %, addit...
PUM
| Property | Measurement | Unit |
|---|---|---|
| Curie point | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 


