Method for recovering hexachlorodisilane from chlorosilane mixtures in process offgas streams

A technology of hexachlorodisilane and exhaust gas flow, which is applied in the direction of silicon compounds, silicon halide compounds, halosilanes, etc., can solve the problems of unfavorable high-reactivity solid substances and difficulties in eliminating high-boiling point components, and achieve low technical cost and Energy cost, low equipment complexity, effect of increased yield

Inactive Publication Date: 2017-09-26
SILICON PROD BITTERFELD GMBH & CO KG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Pure hydrolysis of this component more disadvantageously leads to highly reactive soli

Method used

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  • Method for recovering hexachlorodisilane from chlorosilane mixtures in process offgas streams
  • Method for recovering hexachlorodisilane from chlorosilane mixtures in process offgas streams
  • Method for recovering hexachlorodisilane from chlorosilane mixtures in process offgas streams

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0050] Example 1 (comparative example)

[0051] 767.0 grams of the chlorosilane mixture were separated by distillation, which corresponds to the high-boiling fraction of the distillation of the exhaust gas from silicon production. The fractions listed below were obtained. No further testing of the base solution.

[0052] Table 1. The composition overview of the starting mixture and fractions of the comparative example (TCS=trichlorosilane, STC=silicon tetrachloride, TCDS=tetrachlorodisilane, PCDS=pentachlorodisilane, HCDS=hexachlorodisilane)

[0053]

Example Embodiment

[0054] Example 2 (according to figure 1 , Reaction 5)

[0055] In a three-neck flask at 20°C, mix 0.4 g of catalyst Amberlyst into 303.3 g of chlorosilane mixture The composition was re-determined one week later (Table 2). The catalyst is filtered off, and the mixture is separated by distillation. Three kinds of fractions were extracted. In addition to hexachlorodisilane, the third fraction or base liquid also contains other higher boiling point silicon compounds.

[0056] Table 2. The composition overview of the mixture and fractions of Example 1 (TCS=trichlorosilane, STC=silicon tetrachloride, TCDS=tetrachlorodisilane, PCDS=pentachlorodisilane, HCDS=hexachlorodisilane, HSS = Higher boiling point silicon compound). The composition is determined by NMR spectrum.

[0057]

Example Embodiment

[0058] Example 3 (according to figure 1 , Reaction 5)

[0059] Put 20.5 g of Amberlyst in a three-necked flask at 20°C Mix with 1352.3 grams (about 900 ml) of chlorosilane mixture. The mixture was detected by NMR spectrum after one week. The catalyst is filtered off, and the mixture is separated by distillation. 232.7 grams of hexachlorodisilane can be obtained (Table 3).

[0060] Table 3. Composition overview of the mixture of Example 2 (TCS=Trichlorosilane, STC=Silicon tetrachloride, TCDS=Tetrachlorodisilane, PCDS=pentachlorodisilane, HCDS=hexachlorodisilane, HSS=higher Boiling point silicon compound). The composition is determined by NMR spectrum.

[0061]

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Abstract

The invention pertains to a method for recovering hexachlorodisilane from mixtures, present within process offgas streams, of chorosilanes of the general formula SixHyCl2x+2-y, where x = 1 and y = 0 - 3 and x = 2 and y = 0 - 5. The problem addressed by the present invention is therefore that of providing a method to allow high-yield isolation of the hexachlorodisilane from the aforesaid chlorosilane mixtures arising in the thermal reaction of hydrogen with monosilanes of the general formula SixHyCl2x+2-y, where x is 1 and y is 0 - 2. The problem is solved by a method for recovering hexachlorodisilane from mixtures, present within process offgas streams, of chorosilanes of the general formula SixHyCl2x+2-y, where x = 1 and y = 0 - 3 and x = 2 and y = 0 - 5, which is characterized in that the offgas streams or fractions thereof are converted to the liquid phase and then the partially hydrogenated chlorodisilanes of the general formula SixHyCl2x-2y-1 (x = 2, y = 1 - 5) that are in the chlorosilane mixture are additionally reacted catalytically to hexachlorodisilane, which is isolated from the resulting mixture by distillation.

Description

technical field [0001] The present invention relates to the general formula Si contained in the process off-gas stream x h y Cl 2x+2-y Process for obtaining hexachlorodisilane from mixtures of chlorosilanes in which x=1 and y=0-3 and x=2 and y=0-5. Background technique [0002] The process waste stream contains, in addition to the general formula Si x h y Cl 2x+2-y Chlorodisilanes where x=1 and y=0–3 may also contain significant proportions of the general formula Si x h y Cl 2x+2-y Partially hydrogenated chlorodisilanes where x = 2 and y = 1–5, and small proportions of higher boiling silicon compounds and in the reaction with hydrogen the general formula Si x h y Cl 2x+2-y Chlorosilanes where x=1 and y=0-2. [0003] process, such as by the general formula Si x h y Cl 2x+2-y Monosilane chemical vapor deposition of silicon where x can be equal to 1 and y can be equal to 0–2, such as in chemical vapor deposition of the Siemens method, and in other CVD processes us...

Claims

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Application Information

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IPC IPC(8): C01B33/107
CPCC01B33/10773C01B33/10778C01B33/107B01J31/0237B01J31/0239
Inventor M·施莱M·卡茨F·沙夫
Owner SILICON PROD BITTERFELD GMBH & CO KG
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