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Ni based target material with excellent sputtering properties

A sputtering target, nix-fey-coz technology, used in sputtering, cathode sputtering applications, sputtering coating, etc., can solve problems such as inability to correspond to the seed layer

Inactive Publication Date: 2017-10-13
SANYO SPECIAL STEEL COMPANY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the method of Patent Document 2 can only be used for Co-Fe alloy targets for soft magnetic phases, and cannot be used for Ni alloy targets for seed layers.
In addition, an alloy was used as the Fe source, and the powder sintering method using pure Fe powder was not studied

Method used

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  • Ni based target material with excellent sputtering properties
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Embodiment Construction

[0020] Hereinafter, the present invention will be described in detail.

[0021] The present invention relates to a Ni-based sputtering target, which contains (Ni X -Fe Y -Co Z )-M alloy (here, X represents the ratio of Ni content to the total content of Ni, Fe and Co, Y represents the ratio of Fe content to the total content of Ni, Fe and Co, and Z represents the ratio of Co content to Ni, Fe and Co. The ratio of the total content of Fe and Co.) The Ni-based sputtering target formed, is characterized in that,

[0022] (Ni X -Fe Y -Co Z )-M alloys (hereafter referred to as "Ni-Fe-Co-M alloys" in some cases.), as the M element, containing one or two or more selected from W, Mo, Ta, Cr, V, Nb The total amount of M1 elements is 2-20 at.%, one or more M2 elements selected from Al, Ga, In, Si, Ge, Sn, Zr, Ti, Hf, B, Cu, P, C, Ru Total 0~10at.%,

[0023] The balance consists of Ni, Fe, Co and unavoidable impurities, and,

[0024] When X+Y+Z=100, 20≤X≤98, 0≤Y≤50, 0≤Z≤60, and,...

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Abstract

Provided is an Ni-based alloy sputtering target material having high usage efficiency and low magnetic permeability with which a strong leakage magnetic flux may be obtained, said material containing a (NiX-FeY-CoZ)-M alloy, wherein the Ni based alloy sputtering target material is characterized in that the alloy contains as the element M a total of 2-20 at.% of one or more M1 elements selected from W, Mo, Ta, Cr, V, and Nb, and a total of 0-10 at.% of one or more M2 elements selected from Al, Ga, In, Si, Ge, Sn, Zr, Ti, Hf, B, Cu, P, C, and Ru, with the remainder comprising Ni, Fe, Co, and unavoidable impurities; where X+Y+Z = 100, 20 <= X <= 98, 0 <= Y <= 50, and 0 <= Z <= 60; and the alloy has a microstructure having an Ni-M phase as a matrix phase, the microstructure being one in which an Fe phase and / or a Co phase are dispersed within the matrix phase.

Description

technical field [0001] The present invention relates to a Ni-based alloy sputtering target material capable of obtaining strong leakage magnetic flux, low magnetic permeability and high use efficiency. Background technique [0002] In recent years, the progress of perpendicular magnetic recording has been remarkable. In order to increase the capacity of the drive, the recording density of the magnetic recording medium has been increased. Using the in-plane magnetic recording medium that has been popular in the past, the perpendicular magnetic recording method that can achieve higher recording density has been obtained. Practical. Here, the so-called perpendicular magnetic recording method is a method suitable for high recording density in which the magnetic film of the perpendicular magnetic recording medium is formed by orienting the easy axis of magnetization in a direction perpendicular to the medium surface. [0003] Moreover, in the perpendicular magnetic recording met...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34G11B5/738G11B5/851H01F41/18
CPCC23C14/34H01F41/18G11B5/7379
Inventor 宇野未由纪长谷川浩之
Owner SANYO SPECIAL STEEL COMPANY
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