Manufacturing method of array substrate

Abstract

The invention discloses a manufacturing method of an array substrate. The manufacturing method of an array substrate includes the steps: providing a first substrate; providing a first photomask, and setting an active switch on the first substrate; providing a second photomask, and setting photoresist on the active switch, performing wet etching on the active switch for the first time, performing dry etching on the active switch for the first time, performing wet etching on the active switch for the second time, and performing dry etching on the active switch for the second time, wherein the active switch includes a metal layer, and the etching solution for the metal layer includes phosphoric acid, acetic acid and nitric acid, and the concentration of the nitric acid in the etching solutionis 1.8% to 3.0%; providing a third photomask, and setting a protection layer on the metal; and providing a fourth photomask, and setting a pixel electrode layer on the protection layer. The manufacturing method of an array substrate reduces the concentration of the nitric acid in the etching solution for the metal layer in the etching (2W2D) step, and reduces the edge length of the amorphous silicon layer and the ohmic contact layer in the active switch through regulation and control, so as to reduce the line breaking risk which may occur as the linewidth of the source / drain electrode layer is smaller.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to a method for manufacturing an array substrate. Background technique [0002] Existing displays are generally controlled based on active switches, which have many advantages such as thin body, power saving, and no radiation, and have been widely used, mainly including liquid crystal displays, OLED (Organic Light-Emitting Diode) displays, QLED (Quantum Dot Light Emitting Diodes) displays, plasma displays, etc. From the perspective of appearance and structure, there are both flat-panel displays and curved-surface displays. [0003] For liquid crystal displays, including two parts of the liquid crystal panel and the backlight module (Backlight Module), the working principle of the liquid crystal display is to place liquid crystal molecules in two parallel glass substrates, and apply a driving voltage on the two glass substrates to control the liquid crystal. The direction o...

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Problems solved by technology

[0006] However, with the gradual development of displays in terms of ultra-large size, high driving frequency, and high resolution, the TFT structure is often an inverted staggered structure, that is, the bottom gate electrode and the source / drain are located on both sides of the a-Si layer. , in this structure, there is often a risk of disconnection due to the small line width of the source / drain layer after etching

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