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Microscope focus offset measurement device

A focus shift, measuring equipment technology, applied in the direction of measuring devices, optical instrument testing, machine/structural component testing, etc. Image quality, simple structure, simple structure effect

Pending Publication Date: 2018-01-23
SUZHOU INST OF BIOMEDICAL ENG & TECH CHINESE ACADEMY OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If the detector used by the autofocus system is a non-imaging device, the system cannot distinguish the two surfaces of the cover glass, so it cannot work normally; if the detector used by the autofocus system is an imaging device, but the traditional image processing method is used for data processing If the processing method is different, a large error will be generated, making the focus accuracy unstable and the focus error large

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  • Microscope focus offset measurement device
  • Microscope focus offset measurement device
  • Microscope focus offset measurement device

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Embodiment Construction

[0042] Below in conjunction with specific embodiment, content of the present invention is described in further detail:

[0043] In order to achieve the purpose of the present invention, figure 1 A schematic structural view of an embodiment of the present invention is shown. A microscope focus offset measuring device, comprising: a laser 1 emitting a beam; a spatial filter module 2 to filter the beam; an adjustable aperture 6 to adjust the field of view diaphragm; a beam reduction module 7 to reduce the diameter of the beam; a beam splitter 10 is divided into two beams of transmitted and reflected light; the image sensor 12 obtains the displacement of the light spot on the image sensor 12; the beam is emitted by the laser 1, and passes through the spatial filter module 2, the adjustable small hole 6, the beam reduction module 7, and the beam splitter 10 in sequence and the objective lens 13 of the microscope, after being converged by the objective lens 13, they are reflected b...

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Abstract

The invention discloses a microscope focus offset measurement device. The device comprises a laser for emitting a light beam; a spatial filtering module composed of two lenses and a pinhole located between the two lenses, and used for filtering and processing the light beam, wherein the central axes of the two lenses are coincided with each other; an adjustable aperture for adjusting a visual field diaphragm; a beam-shrinking module for reducing the diameter of the light beam; a beam splitter for splitting the light beam into a light transmission beam and a reflection beam; and an image sensorfor acquiring the displacement of a light spot on the image sensor. The light beam is emitted by the laser. After that, the light beam successively passes through the spatial filtering module, the adjustable aperture, the beam-shrinking module, the beam splitter and the objective lens of a microscope. After the light beam is converged through the objective lens of the microscope, two light beamsare formed after the light beam is reflected by the upper and lower surfaces of the cover glass. The two light beams successively pass through the objective lens to be imaged on the image sensor through the transmission imaging of the beam splitter. The image sensor is provided with a line-array CCD. According to the invention, the interference of reflected light spots on the lower surface of thecover glass can be excluded, and the positioning precision of light spots is improved. Meanwhile, the stability and the response speed of the device are improved.

Description

technical field [0001] The invention relates to the field of optical microscope autofocus, in particular to a microscope focus offset measuring device. Background technique [0002] Focus shift will affect the image clarity, and even lead to the failure of the entire observation experiment. During long-term live cell observation experiments and three-dimensional slice imaging of samples, the phenomenon of microscope focus shift will become extremely significant. Autofocus technology can effectively solve this problem. [0003] Autofocus technology is divided into passive and active two categories. A typical passive focusing method is based on image processing technology, and judges whether the sample is in focus through certain features of the collected images. The existing passive focusing method has unstable focusing accuracy, slow focusing speed, poor real-time performance, and will fail for samples with a certain thickness. Active focusing is to achieve focusing by a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01M11/04
Inventor 李辉简俊明文刚金鑫朱雨赵星羽朱茜
Owner SUZHOU INST OF BIOMEDICAL ENG & TECH CHINESE ACADEMY OF SCI