A kind of excimer laser annealing equipment
A technology of excimer laser and annealing equipment, applied in laser welding equipment, lasers, welding equipment, etc., can solve the problems of uneven gas atmosphere, uneven quality of polysilicon layer, etc., to reduce mura defects, improve uniformity and crystallization The ability to improve the uniformity
Active Publication Date: 2021-01-26
BOE TECH GRP CO LTD +1
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[0004] The embodiment of the present invention provides an excimer laser annealing equipment, which solves the problem of uneven quality of the formed polysilicon layer caused by the uneven gas atmosphere in the laser output channel
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[0027] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0028] The uniformity of the gas in the laser output channel has a crucial influence on the crystallization quality of amorphous silicon (α-Si) into polysilicon (poly-silicon). refer to figure 1 , Figure 2(a) and Figure 2(b), figure 1 It is a schematic diagram of the gas atmosphere distribution in the laser output pipeline 10, and it can be seen that the gas concentration at both ends of the laser output channel 10 is very different from the gas concentration...
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Abstract
An embodiment of the present invention provides an excimer laser annealing device, which relates to the field of display technology and solves the problem of uneven quality of a formed polysilicon layer caused by an uneven gas atmosphere in a laser output channel. The excimer laser annealing equipment includes a strip-shaped laser output channel; the strip-shaped laser output channel includes two end faces and the side surfaces that are all connected to the two end faces; the excimer laser annealing equipment also includes a At least one air intake pipeline on the side, and an air intake pipeline arranged on the end face; wherein, the air intake pipeline is used to input gas into the laser output channel. It is used to improve the uniformity of the gas atmosphere in the laser output channel.
Description
technical field [0001] The invention relates to the field of display technology, in particular to excimer laser annealing equipment. Background technique [0002] The polysilicon layer in existing display devices is usually formed by an Excimer Laser Annealing process. Excimer laser annealing specifically uses the excimer laser beam emitted by the excimer laser annealing equipment to irradiate the amorphous silicon layer on the substrate to be treated for a short time to recrystallize it into a polysilicon layer. [0003] The quality of the excimer laser annealing process determines the process quality of transforming amorphous silicon into polysilicon. In the existing excimer laser annealing equipment, the laser light emitted by the laser generator is injected into the laser output channel, and then transmitted and emitted from the laser output channel. Since the existing strip-shaped laser output channel is only provided with an air intake line on the side of the laser o...
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IPC IPC(8): H01L21/02H01S3/036
CPCH01L21/02678H01S3/036H01L21/02595H01L21/02686H01L21/02532B23K26/0604H01L21/67115B23K26/0006H01L21/02675H01L21/02592B23K26/14B23K26/354
Inventor 张宇吕祖彬谢银
Owner BOE TECH GRP CO LTD