Wide bandgap semiconductor lateral double-diffusion transistor with multi-ring electric field modulation substrate
A lateral double-diffusion and semiconductor technology, which is applied in semiconductor devices, semiconductor/solid-state device manufacturing, circuits, etc., can solve problems such as limited breakdown voltage of devices and longitudinal withstand voltage capability
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[0038] like figure 1 and figure 2 Shown is a wide-bandgap semiconductor lateral double-diffusion transistor with a multi-ring electric field modulated substrate:
[0039] Wide band gap semiconductor material substrate 1, the doping concentration is the concentration of general wide band gap semiconductor single crystal material, the typical value is 1×10 13 cm -3 ~1×10 15 cm -3 ;
[0040] The base region 2 and the drift region 5 located on the surface of the wide band gap semiconductor substrate;
[0041] The source region 3 on the surface of the base region;
[0042] Drain region 4 on the surface of the drift region;
[0043] A multi-loop electric field modulation structure located under the drift region;
[0044] Each ring 6, 7, 8 and 9 of the multi-ring electric field modulation structure can be N-type, P-type doped silicon material, and the typical doping concentration reaches 1×10 14 cm -3 ~1×10 16 cm -3 ;
[0045] Each ring 6, 7, 8 and 9 of the multi-ring e...
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