A kind of flexible substrate and its preparation method, display
A flexible substrate and display technology, which is applied in the manufacture of semiconductor devices, electric solid-state devices, and semiconductor/solid-state devices, etc., can solve the problems of decreased water and oxygen resistance of flexible substrates, easy detachment of organic layers and inorganic layers, etc., and achieves enhanced water resistance. Oxygen capacity, improve quality, eliminate the effect of shedding
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[0015] common reference figure 1 and figure 2 , the first embodiment of the preparation method of the flexible substrate provided by the present invention includes:
[0016] S11: forming a first organic layer 102 on the base substrate 101;
[0017] Specifically, polyimide can be coated on the base substrate 101 by a slit coating device to form a polyimide film, and then the polyimide film can be cured at high temperature to form the first organic layer 102 .
[0018] Optionally, the base substrate 101 is a glass substrate.
[0019] S12: forming a first buffer layer 103 on the first organic layer 102;
[0020] Specifically, silicide can be deposited on the first organic layer 102 by chemical vapor deposition to form the first buffer layer 103 .
[0021] Optionally, the silicide is one or more of a-Si, SiN, and SiO. When the silicide is one of a-Si, SiN, and SiO, the first buffer layer 103 is a single-layer structure , when the silicide is a variety of a-Si, SiN, and SiO,...
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