Exposure device and method capable of manufacturing large-aperture liquid crystal polarization grating device

A liquid crystal polarization grating and exposure device technology, which is applied in the direction of photolithography exposure device, microlithography exposure equipment, optical elements, etc., can solve the problem that it is difficult to achieve a large aperture size, and achieve simple structure, wide range, and process The effect of simple method

Inactive Publication Date: 2018-04-27
CHINA WEAPON EQUIP RES INST
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  • Summary
  • Abstract
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Problems solved by technology

Among them, the interference exposure device has very high requirements on the power, coherence, beam quality and stability of the entire exposure light path of the exposure light source, and it is not easy to achieve a large aperture size.

Method used

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  • Exposure device and method capable of manufacturing large-aperture liquid crystal polarization grating device
  • Exposure device and method capable of manufacturing large-aperture liquid crystal polarization grating device
  • Exposure device and method capable of manufacturing large-aperture liquid crystal polarization grating device

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Abstract

The invention discloses an exposure device and method capable of manufacturing a large-aperture liquid crystal polarization grating device. The exposure device comprises an exposure light source and is characterized by comprising a polarization state controller, a light beam converter and a sample wafer translation platform, the polarization state controller is used for converting a polarization state of the exposure light source into a rotatable linear polarization state, the light beam converter is used for shaping an incident light beam of the exposure light source to be a uniform elongatedlight beam, the sample wafer translation platform is used for controlling translation scanning movement of an exposed sample wafer, the exposure light source, the polarization state controller, the light beam converter and the sample wafer translation platform are sequentially arranged spatially and spaced, and clear apertures of optical parts contained in the four components are maintained in acoaxial relation along a downward linear transmitting direction of the exposure light source. The exposure device is simple in structure, the method is simple and convenient in process, exposure aperture is large, and precise adjusting range of a grating period is wide. The exposure device is convenient for repair and maintenance.

Description

An exposure device and method capable of manufacturing large-aperture liquid crystal polarization grating devices technical field The invention belongs to the technical field of manufacturing optical components, and more specifically relates to an exposure device and method capable of manufacturing a large-diameter liquid crystal polarization grating device. Background technique As a new type of beam deflection control device, liquid crystal polarization grating has excellent characteristics such as large deflection angle, high diffraction efficiency, small size, light weight, low power consumption, and multi-chip cascade for electronically controlled scanning. It has important application value in the fields of photoelectric imaging and detection, target tracking and aiming, laser sensing and space communication. The liquid crystal polarization grating device is a flat plate device composed of multi-layer films attached to a transparent flat glass substrate or other mate...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G02B5/18
CPCG02B5/1857G03F7/70066G03F7/70191G03F7/70358G03F7/7055G03F7/70566
Inventor 徐林史俊锋陈园园臧彦楠尹聿海李朝阳陆成强李晔孙鑫鹏杨振李川马长正李松柏张志强王旭鹏朱超杨宁罗媛
Owner CHINA WEAPON EQUIP RES INST
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