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Substrate calibrating device and detection system

A technology of detection system and calibration device, which is applied to the parts of TV system, image data processing, TV, etc., to achieve the effect of high speed, low cost and high efficiency

Active Publication Date: 2018-05-08
SEMICON MFG INT (SHANGHAI) CORP +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0002] The existing overlay measurement equipment relies on lens imaging to measure the relative deviation between the center positions of two sets of overlay marks. Since the marks need to be positioned and photographed at fixed points, it takes 0.5-1 second to measure a mark

Method used

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  • Substrate calibrating device and detection system
  • Substrate calibrating device and detection system
  • Substrate calibrating device and detection system

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Embodiment Construction

[0050] Various exemplary embodiments of the present invention will now be described in detail with reference to the accompanying drawings. It should be noted that the relative arrangement of components and steps, the numerical expressions and numerical values ​​set forth in these embodiments do not limit the scope of the invention unless specifically stated otherwise.

[0051] Meanwhile, it should be understood that, for the convenience of description, the dimensions of various parts shown in the accompanying drawings are not drawn in an actual proportional relationship.

[0052] The following description of at least one exemplary embodiment is merely illustrative in nature and is in no way intended to limit the invention, its application, or uses.

[0053] Techniques, methods and devices known to those of ordinary skill in the relevant art may not be discussed in detail, but where appropriate, such techniques, methods and devices should be considered part of the Authorized Sp...

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Abstract

The present invention discloses a substrate calibrating device and a detection system, and relates to the technical field of semiconductors. The substrate calibrating device comprises: a plurality ofstate detection units capable of moving from a standby position to a detection position to detect the position state of the substrate and return to the standby position from the detection position; and a multi-dimensional mechanical arm configured to receive and support the substrate, transmit the substrate to a substrate detection place and regulate the substrate on at least one dimension according to the position state, detected by the state detection units, of the substrate to allow the substrate to be located at a target position. The cooperative work of the state detection units and the multi-dimensional mechanical arm is performed to perform calibration of the position state of the substrate to regulate the substrate to the target position so as to facilitate achieving of subsequentnesting measurement.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a substrate calibration device and a detection system. Background technique [0002] The existing overlay measurement equipment relies on lens imaging to measure the relative deviation between the center positions of two sets of overlay marks. Since the marks need to be positioned and photographed at fixed points, it takes 0.5-1 second to measure a mark . As technology nodes shrink and requirements for overlay gradually increase, not only more data points need to be measured, but also accuracy needs to be improved. In the process of overlay measurement, it is very important to calibrate the position of the wafer. This calibration of the wafer position is beneficial to ensure the overlay measurement accuracy to a certain extent. Contents of the invention [0003] An object of the present invention is to provide a substrate calibration device, which can calibrate the po...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/68H01L21/67
CPCH01L21/67259H01L21/68H01L21/681G03F7/70633G03F9/7003G06T7/73H01L2223/5442H01L2223/5446G06T2207/30148H01L23/544H01L2223/54426Y10S901/47H04N23/555H04N23/56G06T7/13B25J9/1697G06T7/0006H01L21/67265H01L21/68707
Inventor 岳力挽伍强
Owner SEMICON MFG INT (SHANGHAI) CORP
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