Packaging structure and method for light-emitting element
A packaging structure and light-emitting element technology, which is applied in the direction of electrical components, semiconductor devices, electric solid devices, etc., can solve the problems of poor airtightness of the packaging structure, and achieve the effects of avoiding falling off, improving airtightness, and simple and easy packaging structure
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[0066] like Figure 4 As shown, the TFT substrate is prepared, and the TFT unit 32 and the silicon dioxide or silicon nitride protective layer 33 have been fabricated on the glass substrate body 31, with a thickness of 20nm, and the protective layer 33 has been etched with ITO via holes or openings. , and then use wet photolithography to make a sub-pixel photoresist insulating layer 6 directly above the corresponding TFT unit 32 on the protective layer 33, the thickness of the photoresist is 0.8um, and the photoresist insulating layer is on the surface of the TFT substrate 6 and on the protective layer 33, sputter ITO transparent conductive film with a thickness of 35nm, etch the ITO, retain the ITO on the TFT substrate corresponding to the edge packaging area and the sub-pixel area, and form the connection enhancement layer 2 and the first electrode unit 411 respectively, wherein , the light-emitting area includes a sub-pixel area, and the edge packaging area surrounds the li...
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