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Gray scale mask making method

A gray-scale mask and production method technology, applied in the field of masks, can solve the problems of affecting PI friction, long production cycle, and high production cost, and achieve the effects of easy operation of the process, reduction of process steps, and improvement of product quality.

Active Publication Date: 2021-03-05
SHENZHEN NEWWAY PHOTOMASK MAKING
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the production of TFT-LCD, the Array process uses a traditional mask plate, which requires multiple photolithography processes, resulting in a long production cycle and high production costs.
In the CF process, the use of traditional masks will bring about the level difference between the color pixels and the underlying black matrix. If the level difference is high, it will affect the friction of the subsequent PI, so that the product cannot form a uniform groove. The liquid crystal molecules at the level difference cannot be well aligned, and light leakage will occur at the edge of the pixel

Method used

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Embodiment Construction

[0038] The present invention will be described in further detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the following exemplary embodiments and descriptions are only used to explain the present invention, not as a limitation to the present invention, and, in the case of no conflict, the embodiments in the present invention and the features in the embodiments can be combined with each other .

[0039] like Figure 1 to Figure 11 As shown, one embodiment of the present invention provides a grayscale mask manufacturing method, comprising the following steps:

[0040] In step S1, a gray scale layer 11 is formed on the surface of one side of the substrate 10, and the cross-sectional schematic diagram of the semi-finished product after this step is as follows figure 2 shown;

[0041] In step S2, a light-shielding layer 21 is formed on the surface of the gray scale layer 11, and the cross-sectional schematic diag...

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Abstract

The embodiment of the invention provides a manufacturing method of a gray-scale mask. The method comprises the following steps of forming a gray-scale layer on one side surface of a substrate; forminga shading layer on the surface of the gray-scale layer; forming a photoresist layer on the surface of the shading layer; carrying out primary exposure on a semi-finished product after the photoresistlayer is formed; carrying out primary development on the semi-finished product subjected to primary exposure; carrying out primary etching on the semi-finished product subjected to primary development; carrying out secondary exposure on the semi-finished product subjected to primary etching; carrying out secondary development on the semi-finished product subjected to secondary exposure; carryingout secondary etching on the semi-finished product subjected to secondary development; and demolding the semi-finished product subjected to secondary etching to obtain a gray-scale mask finished product with a transparent layer pattern, a gray-scale layer pattern and a shading layer pattern. The manufacturing method provided by the embodiment of the invention is relatively simple in technologicalprocess and easy to operate, the obtained gray-scale mask finished product with the transparent layer pattern, the gray-scale layer pattern and the shading layer pattern is applied to an TFT-LCD industry, the manufacturing process can be effectively reduced and the quality of the product is improved.

Description

technical field [0001] Embodiments of the present invention relate to the field of mask technology, and in particular to a method for manufacturing a grayscale mask. Background technique [0002] With the rapid expansion of the flat-panel display market in recent years, the development of supporting industries in flat-panel display has also attracted attention from all walks of life. At present, the rapidly expanding market is being driven by low prices, especially the large-scale TV market. In order to achieve the goal of "low price, large screen, and high image quality" required by the market, LCD panel manufacturers are facing a combination of reducing production costs and low production costs. and performance-enhancing problems. Therefore, how to improve the production efficiency, simplify the manufacturing process, improve the yield rate, and improve the display technology has become the research direction of the liquid crystal display panel industry. In the entire fl...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/32
CPCG03F1/32
Inventor 杜武兵林伟郑宇辰
Owner SHENZHEN NEWWAY PHOTOMASK MAKING
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