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Negative type thermosensitive CTP plate precursor with double-layer structure

A double-layer structure, negative-type technology, applied in the field of negative-type thermal CTP plate precursors, can solve the problems of insufficient stability of active compounds, influence of negative-type plate storage period, incomplete development, etc.

Pending Publication Date: 2018-06-29
LUCKY HUAGUANG GRAPHICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, dark reactions caused by insufficient stability of active compounds, polymerizable or crosslinkable components are prone to incomplete development, which has a significant impact on the storage life of negative working plates

Method used

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  • Negative type thermosensitive CTP plate precursor with double-layer structure
  • Negative type thermosensitive CTP plate precursor with double-layer structure
  • Negative type thermosensitive CTP plate precursor with double-layer structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0060] Production of Negative Thermal Plates

[0061] An aluminum coil in which a 0.30 mm-thick aluminum plate (support) was curled into a roll (coil) was fixed to a feeder. In the surface treatment part, 10% sodium hydroxide is used to immerse the aluminum plate continuously sent out from the sender at 70°C for 60 seconds, after etching, wash it with running water, and wash it with 20% HN0. 3 Perform neutralization washing and water washing. Under the condition of VA=12.7V, use the alternating waveform current of sine wave, in 1% nitric acid aqueous solution at 300 coulomb / dm 2 The electrolytic surface roughening treatment is carried out on the electric current of the anode. The surface roughness thereof was measured and found to be 0.6 μm (expressed as Ra).

[0062] followed by immersion in 30% H 2 SO 4 In aqueous solution, after decontamination at 55°C for 2 minutes, at 33°C in 20% H 2 SO 4 In the aqueous solution, the cathode is arranged on the frosted surface, and ...

Embodiment 2

[0090] In Example 1, except that the composition of the coating solution for the alkali-soluble resin layer was changed, a negative-working thermal plate was manufactured in the same manner as in Example 1.

[0091] (alkali-soluble resin layer)

[0092] N, N-dimethylformamide (DMF) 6 parts by weight

[0093] 2 parts by weight of water

[0094] 25 parts by weight of ethyl cellosolve

[0095] PVB modified resin (Diversitec corporation, DT-5) 1.5 parts by weight

[0096] Youlan 603 (Beijing Chemical Plant) 0.07 parts by weight

[0097] BYK-307 Polyethoxylated Dimethicone Copolymer

[0098] (BYK Chemie, Wallingford, CT, USA) 0.0035 parts by weight

[0099] The structural formula of DT-5 is as follows:

[0100]

Embodiment 3

[0102] In Example 3, a positive-working lithographic printing plate was produced in the same manner as in Example 1, except that the composition of the alkali-soluble resin layer coating solution was changed.

[0103] (alkali-soluble resin layer)

[0104] N, N-dimethylformamide (DMF) 6 parts by weight

[0105] 2 parts by weight of water

[0106] 25 parts by weight of ethyl cellosolve

[0107] Novolac resin BTB29 resin (Weihai Tiancheng Chemical Co., Ltd.) 1.3 parts by weight

[0108] Tert-butylphenol phenolic resin (SP-1077, Lucky Huaguang Printing Technology Co., Ltd.) 0.3 parts by weight

[0109] Polyurethane resin 5715 (Novoon, USA) 0.5 parts by weight

[0110] Youlan 603 (Beijing Chemical Plant) 0.07 parts by weight

[0111] BYK-307 Polyethoxylated Dimethicone Copolymer

[0112] (BYK Chemie, Wallingford, CT, USA) 0.0035 parts by weight

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Abstract

The invention discloses a negative type thermosensitive CTP plate precursor with a double-layer structure. A supporter on a hydrophilic surface is coated with an alkaline soluble resin layer and a negative type photosensitive layer in sequence, and the alkaline soluble resin layer contains alkaline soluble resin, added resin and a coloring dye; and the negative type photosensitive layer comprisesfilm-forming resin, a cross-linking agent, an infrared absorption agent, an acid production source and a coloring dye. The plate material has the advantages of high photosensitive speed, high developing tolerance level, solvent resistance, high press run, and has high storage stability, so that the plate material is more applicable for the requirement of current UV ink printing.

Description

technical field [0001] The invention relates to a negative-type photosensitive lithographic printing plate with a double-layer structure formed on an aluminum plate base, in particular to a negative-type photosensitive lithographic printing plate with a double-layer structure that can be used in a heat-sensitive 800-830nm laser direct plate-making method. Thermal CTP plate precursor. Background technique [0002] CTP (computer-to-plate) technology has replaced the traditional analog plate-making method and has become a way for printing companies to upgrade their technology due to its advantages of digitalization, high efficiency, high quality, simplicity, and environmental protection. At present, CTP plate making methods are mainly divided into three types: thermal CTP (800-830nm), violet laser CTP (405nm) and UV-CTP, and thermal CTP has become the mainstream of the market due to its high imaging precision and mature technology. [0003] According to different imaging mecha...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/09G03F7/004
CPCG03F7/004G03F7/09
Inventor 王泳栗更新
Owner LUCKY HUAGUANG GRAPHICS
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