Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Device for producing cyclized polyisoprene resist

A technology for polyisoprene and production equipment, which is applied in the field of production equipment for cyclized polyisoprene resists, and can solve complex and other problems

Inactive Publication Date: 2018-07-03
CHENGDU WEI ER BO DUN TECH CO LTD
View PDF0 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Most of the existing production devices are relatively complicated. Cyclized polyisoprene is used as an integrated circuit resist. The pros and cons of its production devices have important economic significance for improving product quality and reducing by-product content.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Device for producing cyclized polyisoprene resist
  • Device for producing cyclized polyisoprene resist
  • Device for producing cyclized polyisoprene resist

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0008] Production raw materials and dosage

[0009]

[0010] The production equipment of cyclized polyisoprene resist mainly includes: polymerization vessel (D101), cyclization vessel (D102), washing tower (E101), concentrator (F101), glue mixing vessel (D103), filtration (M101), in which the washing tower (E101) is connected to the cyclization reactor (D102) and the concentrator (F101), and the glue mixing reactor (D103) is connected to the concentrator (F101) and the filter (M101). Among them, the nominal volume of the polymerization reactor (D101) is 630L, the jacket capacity of the cyclization reactor (D102) is 570L, and the outer pot diameter of the glue reactor (D103) is 1200mm.

[0011] The production device of the cyclized polyisoprene resist, the production process is: adding high-purity isoprene into the polymerizer D101, then adding the dehydrated and refined xylene, and dissolving under stirring. Add the initiator butyl lithium, control the temperature to 70°C, and car...

example 2

[0015] Production raw materials and dosage

[0016]

[0017] The production equipment of cyclized polyisoprene resist mainly includes: polymerization vessel (D101), cyclization vessel (D102), washing tower (E101), concentrator (F101), glue mixing vessel (D103), filtration (M101), in which the washing tower (E101) is connected to the cyclization reactor (D102) and the concentrator (F101), and the glue mixing reactor (D103) is connected to the concentrator (F101) and the filter (M101). Among them, the nominal volume of the polymerization reactor (D101) is 660L, the jacket capacity of the cyclization reactor (D102) is 590L, and the outer pot diameter of the glue reactor (D103) is 1300mm.

[0018] The production device of the cyclized polyisoprene resist, the production process is: adding high-purity isoprene into the polymerizer D101, then adding the dehydrated and refined xylene, and dissolving under stirring. Add the initiator butyl lithium, control the temperature to 76°C, and car...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Densityaaaaaaaaaa
Viscosityaaaaaaaaaa
Login to View More

Abstract

Provided is a device for producing cyclized polyisoprene resist. The device mainly comprises: a polymerization kettle (D101), a cyclization kettle (D102), a washing tower (E101), a concentrator (F101), a glue preparation kettle (D103) and a filter (M101), wherein the washing tower (E101) is connected with the cyclization kettle (D102) and the concentrator (F101) respectively, the glue preparationkettle (D103) is connected with the concentrator (F101) and the filter (M101) respectively, and the polymerization kettle (D101) has a nominal capacity of 630-660 L.

Description

Technical field [0001] The present invention relates to a compound synthesis device, in particular to a production device for cyclized polyisoprene resist. Background technique [0002] Cyclized polyisoprene resist is mainly used for micro processing in medium and large-scale integrated circuits, power tubes, and precision machinery manufacturing. Most of the existing production devices are relatively complicated. As the cyclized polyisoprene is used as a resist for integrated circuits, the advantages and disadvantages of the production devices have important economic significance for improving product quality and reducing by-product content. Summary of the invention [0003] The purpose of the present invention is to provide a production device for cyclized polyisoprene resist, which mainly includes: polymerization vessel (D101), cyclization vessel (D102), washing tower (E101), concentrator (F101), glue The kettle (D103) and filter (M101), among which the washing tower (E101) is...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C08F136/08C08F8/48
CPCC08F136/08C08F8/48
Inventor 刘洋
Owner CHENGDU WEI ER BO DUN TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com