Method and system for obtaining parameter change status of vacuum electronic device under thermal state
A vacuum electronic device and parameter change technology, applied in the field of vacuum electronics, to achieve the effects of simplifying thermal deformation analysis, improving work performance, and optimizing work parameters
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0044]The preferred embodiments of the present invention will be described below in conjunction with the accompanying drawings. It should be understood that the preferred embodiments described here are only used to illustrate and explain the present invention, and are not intended to limit the present invention. The invention can also be applied to study the influence of thermal state on the performance of vacuum electronic devices such as klystrons and magnetrons.
[0045] figure 1 It is a flow chart of a calculation method for vacuum electronic device performance parameters in a thermal state according to the present invention, including the following steps: a calculation method for vacuum electronic device performance parameters in a thermal state, including the following steps:
[0046] The first step is to establish a vacuum electronic device model, input the working parameters of the vacuum electronic device, calculate the injection wave interaction of the vacuum electro...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com