Biochemical sensor and manufacturing method thereof
A technology of biochemical sensor and production method, applied in the field of biochemical sensor and its production, can solve the problems of low responsivity and sensitivity of biochemical sensor, achieve the effect of improving responsivity and sensitivity, and increasing contact area
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[0069] Provide SOI substrates, such as figure 2As shown, and clean the surface of the substrate, put the silicon wafer in the APM solution of Qixing cleaning tank and rinse for 10 minutes to remove the surface particles of the silicon wafer, then rinse with deionized water for 5 minutes and dry; then use LamResearch 203 single wafer cleaning equipment, in dilute HF solution (HF:H 2 (0=1:100), wash for 120s;
[0070] Send the cleaned chips into ASM E2000pl us Epitaxial growth is performed in an epitaxial reaction chamber of a reduced pressure-chemical vapor deposition (RPCVD) device. In the environment of the decompression epitaxy reaction chamber, the silicon wafer is first baked in a hydrogen environment at a high temperature for 20 minutes, in order to remove the natural oxide layer that may remain on the surface. Then lower the chamber temperature to 650°C and feed SiH 2 Cl 2 and GeH 4 Gas 90s, grow the GeSi layer, that is, the support layer, and then cut off the GeH...
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