Unlock instant, AI-driven research and patent intelligence for your innovation.

High-density 3D vertical RERAM with bidirectional threshold-type selector

A two-way selection, selector technology, applied in instruments, semiconductor devices, static memory, etc., can solve the problems of difficult scalability, low storage density, high cost, etc.

Inactive Publication Date: 2018-07-31
WESTERN DIGITAL TECH INC
View PDF6 Cites 12 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Some memory architectures, such as one-transistor-one-resistor (1T1R) architectures, may be relatively easy to implement, may have little or no disturb effects or sneak paths, and / or may have high parallelism, but may have large footprint, which creates scalability difficulties
Such memory architectures may also be difficult or impossible to stack for increased storage density, resulting in higher cost, lower storage density

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High-density 3D vertical RERAM with bidirectional threshold-type selector
  • High-density 3D vertical RERAM with bidirectional threshold-type selector
  • High-density 3D vertical RERAM with bidirectional threshold-type selector

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0020] In the following detailed description, reference is made to the accompanying drawings which form a part hereof. In addition to the illustrative aspects, embodiments and features described above, other aspects, embodiments and features will become apparent by reference to the drawings and the following detailed description. Descriptions of elements in each figure may refer to elements of previous figures. Like numbers may refer to like elements in the figures, including alternate embodiments of the same elements.

[0021] Aspects of the present disclosure provide various apparatuses, devices, and methods for reducing leakage current in resistive random access memory (ReRAM). In one aspect, a ReRAM cell is provided with a bidirectional threshold-type selector connected in series with a resistive memory element such that leakage current through non-selected cells can be substantially reduced.

[0022] figure 1 A cutaway perspective view of one embodiment of a system 100...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present disclosure, in various embodiments, describes three-dimensional (3D) vertical resistive random access memory (ReRAM) structures. In one embodiment, a memory device includes a resistive memory element and a selector coupled in series with the resistive memory element. A turn-on voltage of the selector is greater than a bias voltage of the memory device in an unselected state such that the selector remains in a turn-off state when the memory device is unselected, and the selector is configured to have substantially the same resistance in both a forward bias direction and a reverse bias direction in a turn-on state.

Description

[0001] This application claims priority and benefit to U.S. Provisional Application Serial No. 62 / 449,528, filed January 23, 2017, entitled "High Density 3D Vertical RERAM with Bidirectional Threshold-Type Selector," the entire contents of which Incorporated herein by reference. technical field [0002] In various embodiments, the present disclosure relates to vertical memory structures, and more particularly to three-dimensional (3D) vertical resistive random access memory (ReRAM) structures. Background technique [0003] In a variety of consumer electronics and computers, solid-state data storage devices incorporating non-volatile memory (NVM) often replace or supplement conventional spinning hard drives for mass storage. Some memory architectures, such as one-transistor-one-resistor (1T1R) architectures, may be relatively easy to implement, may have little or no disturb effects or sneak paths, and / or may have high parallelism, but may have large footprint, which creates ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G11C13/00H01L27/24
CPCG11C13/0007G11C13/0026G11C13/0028H10B63/00G11C13/0002G11C2213/15G11C2213/71G11C2213/76G11C2213/50G11C13/0004G11C13/003G11C2213/74G11C13/0038H10B63/24H10B63/34H10B63/845H10N70/823H10N70/20H10N70/8833
Inventor 催元镐J.库马尔D.贝多Z.Z.班迪克宋承桓
Owner WESTERN DIGITAL TECH INC
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More