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washing machine

A cleaning machine and a technology to be cleaned, applied in the field of cleaning machines, can solve the problems of wasting production line time and materials, wasting production line time, polluting downstream equipment, etc., to reduce material and time loss, speed up efficiency, and improve backwashing efficiency. Effect

Active Publication Date: 2020-09-01
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

There are problems such as polluting downstream equipment, wasting production line time and materials, etc.
[0008] 2. It is unavoidable that the substrate after being cleaned by the current cleaning machine occasionally has abnormalities of poor drying
There are also problems such as cumbersome process and waste of production line time.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0026] see figure 1 , which is a schematic diagram of the overall structure of a preferred embodiment of the cleaning machine of the present invention. The present invention proposes a design of a water residue detection and backwashing cleaning machine. The cleaning machine has a loading side for the substrate to be cleaned to enter, and a loading side for the cleaned substrate to leave. It mainly includes: a foreign matter detection unit 10 and a return Washing unit 20; the foreign matter detection unit 10 is located before the unloading side, and is used to detect whether the substrate is cleaned before the substrate leaves the cleaning machine; 10 The unqualified substrates are returned from the unloading side to the loading side to be re-cleaned by the cleaning machine.

[0027] Similar to a conventional cleaning machine, the cleaning machine of the present invention can include a transfer roller 1, a transfer unit 2 positioned at the import side, and a transfer unit 3 p...

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PUM

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Abstract

The invention relates to a cleaner. The cleaner is provided with a moving-in side allowing a cleaning substrate to enter and a moving-out side allowing the cleaned substrate to move out and comprisesa foreign matter detection unit and a re-washing unit, wherein the foreign matter detection unit is located before the moving-out side and used for detecting whether cleaning of the substrate is qualified before the substrate leaves the cleaner; the re-washing unit is located between the moving-out side and the moving-in side and used for returning the substrate detected by the foreign matter detection unit to be disqualified to the moving-in side to be rewashed by the cleaner. The cleaner can increase the substrate cleaning yield, reduce the influence of water residues or un-cleaned matters on downstream coater equipment and improve the re-washing efficiency before coating. The abnormal treatment efficiency before coating of the production line is increased, and material consumption and time consumption for re-washing of abnormal substrates are reduced.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a washing machine. Background technique [0002] Flat-panel display devices have many advantages such as thin body, power saving, and no radiation, and have been widely used. Existing flat panel display devices mainly include liquid crystal display devices (Liquid Crystal Display, LCD) and organic light emitting diode display devices (Organic Light Emitting Display, OLED). [0003] Taking the liquid crystal display as an example, it usually consists of a color filter substrate (Color Filter, CF), a thin film transistor substrate (Thin Film Transistor, TFT), a liquid crystal (Liquid Crystal, LC) sandwiched between the color filter substrate and the thin film transistor substrate, and a sealing It is composed of a sealant, and its molding process generally includes: the front-end array (Array) process (thin film, yellow light, etching and stripping), the middle-stage cell (Cell) ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67H01L21/02
CPCH01L21/02041H01L21/67023
Inventor 施杰
Owner WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD