Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Silicon-based liquid crystal cleaning device and cleaning method

A silicon-based liquid crystal and cleaning device technology, which is applied to liquid cleaning methods, cleaning methods and utensils, water supply devices, etc., can solve the problems of fragmentation risk, silicon-based liquid crystal scratches, scratches, etc., to reduce cleaning time, Prevents scratches and improves work efficiency

Active Publication Date: 2022-07-08
南京芯视元电子有限公司
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In the existing liquid crystal on silicon cleaning process, the mechanism to control the liquid crystal on silicon is the rollers on both sides of the liquid crystal on silicon, which will cause scratches / scratches on the surface of the liquid crystal on silicon
At the same time, in the cleaning process, it is necessary to strictly coordinate all the driving mechanisms in step, and any abnormality in any link may cause the risk of fragmentation

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Silicon-based liquid crystal cleaning device and cleaning method
  • Silicon-based liquid crystal cleaning device and cleaning method
  • Silicon-based liquid crystal cleaning device and cleaning method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0028] In order to make the purposes, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments These are some embodiments of the present invention, but not all embodiments. The components of the embodiments of the invention generally described and illustrated in the drawings herein may be arranged and designed in a variety of different configurations.

[0029] Thus, the following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the invention as claimed, but is merely representative of selected embodiments of the invention. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary ski...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a silicon-based liquid crystal cleaning device and a cleaning method, and relates to the technical field of silicon-based liquid crystal product.The silicon-based liquid crystal cleaning device comprises a rectangular frame with a containing space and a plurality of U-shaped fixing frames which are arranged on the rectangular frame around the containing space and arranged at intervals in the first direction; the plane where the fixing frame is located is perpendicular to the first direction, the fixing frame comprises three sub-supports which are sequentially connected, clamping grooves are formed in the three sub-supports correspondingly, and groove openings of the clamping grooves face the containing space correspondingly; the cleaning assembly and the rectangular frame are sequentially distributed in the second direction perpendicular to the first direction. According to the silicon-based liquid crystal cleaning device provided by the invention, scratches and scratches on the surface of the silicon-based liquid crystal in the cleaning process can be avoided, the risk of fragment is reduced, and the cleaning yield and the cleaning efficiency are improved.

Description

technical field [0001] The invention relates to the technical field of silicon-based liquid crystal production, in particular to a silicon-based liquid crystal cleaning device and a cleaning method. Background technique [0002] Liquid Crystal on Silicon (LCoS) is a reflective micro-display device, and has the advantages of small size, high resolution and high light utilization (high aperture ratio) compared with transmissive liquid crystals. At present, liquid crystal on silicon has been widely used in emerging products such as augmented reality, virtual reality, vehicle head-up display, optical communication and micro-projection. [0003] The preparation of liquid crystal on silicon devices is more difficult than the preparation of traditional transmissive liquid crystal devices, and its cleanliness is much higher than that of traditional transmissive liquid crystal devices. For the liquid crystal on silicon cleaning process, at least the removal rate of particles above 1...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/02B08B3/08B08B3/12B08B13/00F26B21/00A61L2/10A61L2/26
CPCB08B3/02B08B3/08B08B3/12B08B13/00F26B21/001A61L2/10A61L2/26Y02P70/50
Inventor 何军胡健
Owner 南京芯视元电子有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com