A chemical vapor deposition furnace gas preheating device

A chemical vapor deposition and gas preheating technology, which is applied in gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of insufficient preheating, occupying effective loading space, and affecting deposition efficiency, etc., to achieve It facilitates the initial loading, improves the circulation distance, and improves the effect of contact area

Active Publication Date: 2020-06-09
XIAN AVIATION BRAKE TECH
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  • Abstract
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  • Claims
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Problems solved by technology

[0006] The present invention aims at the problem of insufficient preheating in the existing preheater, which affects the deposition efficiency, and the problem that the preheater occupies the effective charging space, and improves it, and designs a preheating device with sufficient preheating and does not occupy the effective charging space , thereby increasing production efficiency

Method used

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  • A chemical vapor deposition furnace gas preheating device
  • A chemical vapor deposition furnace gas preheating device

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Embodiment Construction

[0027] The specific embodiments of the present invention will be further described below in conjunction with the drawings and specific embodiments.

[0028] see figure 1 , a chemical vapor deposition furnace gas preheating device of the present invention is composed of a base 1, a bottom plate 2, a heat exchange base 3, a heat exchange section 4, a top cylinder 5, and a top cover 6;

[0029] The base 1 is placed on the bottom of the furnace, the center hole is aligned with the furnace inlet, and the upper middle part is provided with guide ribs 1I to extend the flow distance of carbon source gas on it, and the outer circle is designed with stepped grooves for The bottom plate 2 on its upper part is assembled and realizes the inner cavity sealing between the two.

[0030] The bottom plate 2 is used to install the heat exchanger and carry the workpiece, and is assembled on the base 1 through the steps of its outer circle, forming a carbon source gas passage with the base 1 . T...

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Abstract

The invention belongs to the technical field of carbon / carbon composite chemical vapor deposition, and relates to a gas preheating device of a chemical vapor deposition furnace. The gas preheating device is composed of six parts of a base, a bottom plate, a heat exchange base, a heat exchange segment, a top barrel and a top cover. According to the gas preheating device, preheating is sufficient, the preheating device does not occupy effective charging space, and the production efficiency can be greatly improved.

Description

technical field [0001] The invention belongs to the technical field of chemical vapor deposition of carbon / carbon composite materials, and relates to a gas preheating device for a chemical vapor deposition furnace. Background technique [0002] In the chemical vapor deposition process of carbon / carbon composite materials, carbon source gas is generally preheated to improve the densification efficiency and product quality of the chemical vapor deposition process. [0003] At present, there are mainly two types of preheating devices used in the chemical vapor deposition process of carbon-carbon composite materials, single-tube preheating devices and laminated preheating devices. [0004] The cylinder preheating device is a single smooth wall graphite cylinder structure, which is placed above the carbon source gas inlet of the furnace, and the carbon source gas is introduced into the top of the preheater through the metal intake pipe, and the carbon source gas is downward from ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/455C23C16/44C23C16/26
CPCC23C16/26C23C16/44C23C16/45512
Inventor 卢杰陈涛韩文静任飒
Owner XIAN AVIATION BRAKE TECH
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