A boron-doped diamond film electrode modified by fluorine tin and its preparation method and application
A thin-film electrode and electrode technology, which is applied in the field of boron-doped diamond thin-film electrode and its preparation, can solve the problems of covering up the excellent properties of BDD, and achieve the effects of uniform particles, increased conductivity, and not easy to fall off
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[0032] This embodiment provides a fluorine tin modified BDD film electrode and a preparation method thereof. The preparation method comprises the following steps:
[0033] (1) Cut the Si sheet into small pieces of 15mm×15mm as the substrate, polish it with sandpaper and boil it for 15 minutes; then grind the silicon substrate with 0.5 μm diamond paste for 10 minutes, and then use acetone, absolute ethanol, deionized Ultrasonic cleaning with water for 5 minutes, and finally drying to obtain a pretreated silicon substrate;
[0034] Put the pre-treated silicon substrate into the 3KPa pressure hot wire vapor deposition chamber, pass hydrogen, methane, and borane into the deposition chamber at a volume ratio of 98:2:0.2, and use tungsten wire as the hot wire. The distance between the wire and the silicon substrate is 8mm, and the temperature of the hot wire is 850°C; adjust the control voltage, increase the current passing through the hot wire, and increase the temperature of the ...
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