Self-cleaning type nano-colloid jet-flow polishing device

Abstract

The invention discloses a self-cleaning type nano-colloid jet-flow polishing device. A plunger pump (4) is mounted on a first pipeline (1) and a second pipeline (5); a nano-colloid container (1) is connected with the first pipeline (1) and a fifth pipeline (21); a cleaning device (23) is connected with a sixth pipeline (22) and a seventh pipeline (27); a pressurized energy accumulation device (8)is mounted on a third pipeline (7) and a fourth pipeline (9); a cavitation jet-flow spraying nozzle (14) is mounted at the tail end of the fourth pipeline (9); laser sensors (29) are arranged on the third pipeline, the fifth pipeline and the spraying nozzle respectively and are mounted in a non-contact manner. By adopting the self-cleaning type nano-colloid jet-flow polishing device, the problemsof a common nano-colloid jet-flow device that nano-colloid is easy to deposit and easy to pollute, nano-colloid liquid flow cannot be continuously sprayed, the device is uneasy to wash and maintain, and the jet-flow polishing efficiency of an optical element is low and the like are solved; sealed type circulation of a nano-colloid solution is realized.

Description

technical field [0001] The invention belongs to the field of ultra-smooth surface processing of optical elements, and in particular relates to a jet polishing device. Background technique [0002] Nano-colloid jet polishing is a new type of optical component polishing method derived from micro-abrasive jet polishing. Through chemical bonding and fluid shearing, atomic-level removal of optical component surface materials can be achieved. During the removal process, the -OH in the nanocolloid combines with the atoms on the surface of the component to activate the atoms on the surface of the component, and the nanoparticles in the nanocolloid solution combine with the -OH in the nanocolloid, and the nanocolloid particles are sprayed out by the nozzle through their own kinetic energy The conversion of the component surface atoms is firmly combined with chemical bonds. Under the shear force of the nano-colloid fluid, the chemical bonds between the component surface atoms and othe...

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Problems solved by technology

[0005] The purpose of the present invention is to solve the problem that the nano-colloid solution existing in traditional jet polishing is easily polluted, the liquid flow is discontinuous during the jet process, the equipment is not easy to clean after polishing, the cleaning process is discontinuous with the polishing process, and the efficiency is low when processing optical elements. problem, a self-cleaning nano-colloid jet polishing device is provided

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