An exposure method for effectively preventing photoresist from contaminating a mask plate

Abstract

The invention relates to the technical field of exposure equipment, and discloses a method for effectively preventing photoresist from contaminating a mask platee, an exposure means is included, the exposure device comprises a box body, An ultra-high pressure mercury lamp is fixedly installed on the top in the box body, A mask plate is arranged just below the ultra-high pressure mercury lamp, a first pressure bar and a second pressure bar are symmetrically arranged in the middle parts of both sides of the mask plate, An exposure stage is arranged just below the mask plate, a groove is arrangedon the upper surface of the exposure stage, a substrate is arranged in the groove, symmetrical guide rail grooves are respectively arranged on both sides of the groove, and sliders symmetrically arranged on both sides of the bottom end of the scraper plate are respectively slidably connected in the guide rail grooves; A light-transmitting plate is arranged between the substrate and the mask plate; A first air outlet in the left side wall of the box body is connected with a cold air outlet of the refrigeration device; The second ventilation port in the right side wall of the box body is connected with the air inlet of the gas purification device through the air guide pipe provided with the air suction pump. The invention solves the problem that the mask plate is liable to be contaminated by photoresist.

Description

technical field [0001] The invention relates to the technical field of exposure equipment, in particular to an exposure method for effectively preventing photoresist from polluting a mask plate. Background technique [0002] Exposure machine refers to the machine equipment that transfers the image information on the film or other transparent body to the surface coated with photosensitive material by turning on the light and emitting ultraviolet rays of UVA wavelength. [0003] During the working process of the exposure machine, when the mask plate is in direct contact with the photoresist layer, the exposed pattern is equivalent to the pattern resolution on the mask plate, but the mask plate is directly in contact with the photoresist layer, and the mask plate It is easy to be polluted by photoresist, and then accelerates the wear of the mask plate, making the mask plate easily damaged, thereby reducing the clear image of the exposed pattern, resulting in the technical probl...

AI Technical Summary

Problems solved by technology

[0005] Aiming at the deficiencies of the prior art, the present invention provides an exposure method that can effectively prevent photoresist from polluting the mask, which can effectively prevent photoresist from polluting the mask, improve the definition of exposure patterns, and have better exposure effects. , reduce ultraviolet energy, absorb ultraviolet rays, increase the uniformity of photoresist distribution on the substrate surface, reduce the fluidity of photoresist distribution on the substrate surface, absorb xylene volatilized from photoresist, etc., which solves the problem of easy masking Contaminated by photoresist, which reduces its service life and exposure clarity, thereby reducing the exposure effect

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