Temperature control device for semiconductor production
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- BEIJING JINGYI AUTOMATION EQUIP CO LTD
- Publication Date
- 2018-12-18
Smart Images

Figure 1
Abstract
Description
technical field
[0001] The present disclosure relates to the field of semiconductor production, and in particular, to a temperature control device for semiconductor production. Background technique
[0002] At present, when controlling the temperature of the semiconductor production process, it is necessary to use special temperature control equipment. Temperature control equipment is mainly used in ETCH (etching), PVD (physical vapor deposition), CVD (chemical vapor deposition) and other semiconductor processing processes to provide high-precision and stable circulating liquid for load equipment (such as semiconductor processing reaction chamber) inlet temperature. The current temperature control equipment for semiconductor production only uses a refrigeration system to cool down the load equipment, resulting in a large load of the refrigeration system, which is not conducive to energy saving. Contents of the invention
[0003] The purpose of the present disclosure is t...