Graphene strip heterojunction double-gate tfet and its switching characteristic improvement method
A graphene and heterojunction technology, applied in semiconductor devices, electrical components, transistors, etc., can solve the problem of small on-state current, reduce leakage current, improve switching characteristics, and increase on-state current.
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[0019] The present invention will be further described below in conjunction with accompanying drawing.
[0020] The present invention takes the double-gate TFET structure as an example, adopts figure 1 The hybrid graphene strips shown, demonstrate that this device structure can enhance the switching characteristics of TFETs.
[0021] Such as figure 2 As shown, the graphene strip heterojunction double-gate tunneling field effect transistor (TFET) includes a top gate 1, a bottom gate 2, a gate oxide layer 3, a source region 4, a drain region 5 and a channel 6, wherein the gate The oxide layer is made of SiO 2 Materials; source region 4, drain region 5 and channel 6 are located between the top gate oxide layer 3 and the bottom gate oxide layer 3; the bottom gate 2 is located under the gate oxide layer 3 at the bottom, and the top gate 1 is located at the top gate oxide layer 3 above, and the top gate 1 and the bottom gate 2 are aligned with the channel 6 in the length directi...
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