113 results about "Write margin" patented technology

A method and system for providing a magnetic memory is described. The magnetic memory includes magnetic storage cells in an array, bit lines, and source lines. Each magnetic storage cell includes at least one magnetic element. The magnetic element(s) are programmable by write currents driven through the magnetic element(s). Each magnetic element has free and pinned layer(s) and a dominant spacer. The magnetic memory is configured such that either the read current(s) flow from the free layer(s) to the dominant spacer if the maximum low resistance state read current divided by the minimum low resistance state write current is greater than the maximum high resistance state read current divided by the minimum high resistance state write current or the read current(s) flow from the dominant spacer to the free layer(s) if the maximum low resistance state read current divided by the minimum low resistance state write current is less than the maximum high resistance state read current divided by the minimum high resistance state write current.

The invention provides a semiconductor integrated circuit device provided with an SRAM that satisfies the requirements for both the SNM and the write margin with a low supply voltage. The semiconductor integrated circuit device include: multiple static memory cells provided in correspondence with multiple word lines and multiple complimentary bit lines; multiple memory cell power supply lines that each supply an operational voltage to each of the multiple memory cells connected to the multiple complimentary bit lines each; multiple power supply circuits comprised of resistive units that each supply a power supply voltage to the memory cell power supply lines each; and a pre-charge circuit that supplies a pre-charge voltage corresponding to the power supply voltage to the complimentary bit lines, wherein the memory cell power supply lines are made to have coupling capacitances to thereby transmit a write signal on corresponding complimentary bit lines.

In a reading operation, an off time and a reading time of a holding control transistor is controlled by a replica circuit, so that a read margin is enlarged. Furthermore, a high power source potential and a low power source potential of an SRAM memory cell are switched in reading and writing operations of the memory cell and in a data holding state by a power source potential switching portion. As a result, a write margin is enlarged, and a leakage current is reduced.

A semiconductor structure including SRAM cells with improved write margins and a method for forming the same are provided. The semiconductor structure comprises a substrate including a core circuit and an SRAM cell. The SRAM cell includes a pull-up PMOS device that comprises a first source/drain region in the substrate, a first SiGe stressor having a portion overlapping at least a portion of the first source/drain region, and a first current-tuning region having a portion overlapping at least a portion of the first source/drain region. The core circuit comprises a core PMOS device that comprises a second source/drain region in the substrate, and a second SiGe stressor having a portion overlapping at least a portion of the second source/drain region. The core PMOS device is free of current-tuning regions.

Memory elements are provided that exhibit immunity to soft error upset events when subjected to radiation strikes such as high-energy atomic particle strikes. The memory elements may each have four inverter-like transistor pairs that form a bistable element and a pair of address transistors. There may be four nodes in the transistor each of which is associated with a respective one of the four inverter-like transistor pairs. There may be two control transistors each of which is coupled between the transistors in a respective one of the inverter-like transistor pairs. During data writing operations, the two control transistors may be turned off to temporarily decouple the transistors in two of the four inverter-like transistor pairs.

Integrated circuit memory devices include a memory cell configured to receive a power supply signal and a write assist circuit. The. write assist circuit is configured to improve write margins by reducing a magnitude of the power supply signal supplied to the memory cell from a first voltage level to a lower second voltage level during an operation to write data into the memory cell. The memory device further includes at least one bit line electrically coupled to the memory cell and a read assist circuit. The read assist circuit may be configured to improve read reliability by partially discharging the at least one bit line from an already precharged voltage level to a lower third voltage level in preparation to read data from the memory cell.

Each memory cell has a pair of inverters whose inputs and outputs are connected to each other and holds complementary data respectively in storage nodes which are outputs of the inverters. In a write operation during which the complementary data are written to the storage nodes respectively, the power control circuit sets a power supply voltage of the inverter having the storage node to which low level is written lower than a power supply voltage of the inverter having the storage node to which high level is written. Since power supply capability to the inverter having the storage node to which the low level is written lowers, the voltage of the storage node easily changes to the low level. That is, a write margin of a memory cell can be improved.

A random access memory cell including: two double-gate access transistors respectively arranged between a first bit line and a first storage node and between a second bit line and a second storage node, a word line, a first double-gate load transistor and a second double-gate load transistor, a first double-gate driver transistor and a second double-gate driver transistor, a mechanism to apply a given potential to at least one electrode of each of the load or driver transistors, and a mechanism to cause the given potential to vary.

A multiple-bit memory cell for use in a magnetic random access memory circuit includes a first adiabatic switching storage element having a first anisotropy axis associated therewith and a second adiabatic switching storage element having a second anisotropy axis associated therewith. The first and second anisotropy axes are oriented at a substantially non-zero angle relative to at least one bit line and at least one word line corresponding to the memory cell. The memory cell is configured such that two quadrants of a write plane not used for writing one of the storage elements can be beneficially utilized to write the other storage element so that there is essentially no loss of write margin in the memory cell.

A cladding structure for a conductive line used to switch a free layer in a MTJ is disclosed and includes two cladding sidewalls on two sides of the conductive line, a top cladding portion on a side of the conductive line facing away from the MTJ, and a highly conductive, non-magnetic spacing control layer formed between the MTJ and conductive line. The spacing control layer has a thickness of 0.02 to 0.12 microns to maintain the distance separating free layer and conductive line between 0.03 and 0.15 microns. The spacing control layer is aligned parallel to the conductive line and contacts a plurality of MTJ elements in a row of MRAM cells. Half-select error problems are avoided while maintaining high write efficiency. A spacing control layer may be formed between a word line and a bottom electrode in a top pinned layer or dual pinned layer configuration.