The invention belongs to the technical field of 
quantum-effect devices, in particular relates to a 
quantum-effect device based on an MIS (
Metal-Insulator-
Semiconductor) structure. The 
quantum-effect device comprises a 
semiconductor substrate, a source 
electrode, a drain 
electrode, a tunneling insulator layer and a 
metal layer, wherein the source 
electrode, the drain electrode, the tunneling insulator layer and the 
metal layer are arranged on the 
semiconductor substrate; and the 
metal layer, the tunneling insulator layer and the 
semiconductor layer form an MIS structure. The quantum-effect device further comprises a grid electrode and a 
grating type insulator layer, wherein the grid electrode is arranged at one side of the MIS structure, and the 
grating type insulator layer is arranged between the MIS structure and the grid electrode. According to the quantum-effect device based on the MIS structure, a quantum tunneling effect and a 
gated diode are integrated together, and a gated 
metal insulator semiconductor 
diode based on the quantum tunneling effect is manufactured by using a platform process. A suitable bias 
voltage is applied to the quantum-effect device so that the tunnelingefficiency of the quantum-effect device can be controlled, a 
drain current can be reduced to be much smaller than the 
drain current of a normal 
diode, and the power dissipation of a 
chip is reduced.