Double-gate TFET with graphene strip heterojunction and switch characteristic enhance method thereof

A graphene, heterojunction technology, applied in electrical components, transistors, circuits, etc., can solve problems such as small on-state current

Active Publication Date: 2018-12-18
HANGZHOU DIANZI UNIV
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Problems solved by technology

[0004] The purpose of the present invention is to provide a graphene strip heterojunction double-gate TFET for the problem of small open-state current of the existing TFET device, and to provide a method for improving the switching characteristics of the double-gate TFET by using the graphene strip heterojunction method, this method utilizes the high electron mobility of gr

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  • Double-gate TFET with graphene strip heterojunction and switch characteristic enhance method thereof
  • Double-gate TFET with graphene strip heterojunction and switch characteristic enhance method thereof
  • Double-gate TFET with graphene strip heterojunction and switch characteristic enhance method thereof

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[0019] The present invention will be further described below in conjunction with accompanying drawing.

[0020] The present invention takes the double-gate TFET structure as an example, adopts figure 1 The hybrid graphene strips shown, demonstrate that this device structure can enhance the switching characteristics of TFETs.

[0021] Such as figure 2 As shown, the graphene strip heterojunction double-gate tunneling field effect transistor (TFET) includes a top gate 1, a bottom gate 2, a gate oxide layer 3, a source region 4, a drain region 5 and a channel 6, wherein the gate The oxide layer is made of SiO 2 Materials; source region 4, drain region 5 and channel 6 are located between the top gate oxide layer 3 and the bottom gate oxide layer 3; the bottom gate 2 is located under the gate oxide layer 3 at the bottom, and the top gate 1 is located at the top gate oxide layer 3 above, and the top gate 1 and the bottom gate 2 are aligned with the channel 6 in the length directi...

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Abstract

The invention discloses a graphene strip heterojunction double-gate TFET and a switch characteristic lifting method thereof. How to increase the on-state current of TFET is an important research direction of TFET. The source region, the drain region and the channel between the source region and the drain region constitute a graphene band heterojunction; The channel consists of the first section and the second section along the direction from the source area to the drain area. The source region, the second channel region and the drain region are all armchair graphene nanoribbons. The stretchingdirection of the first segment of the channel is at an angle to the stretching direction of the armchair graphene nano band. At the close state, the first section of the channel is a band gap armchair graphene nano band along the length direction of the device, and the density of regional states is 0, so that the close state current is restrained; and at the close state, the first section of thechannel is a band gap armchair graphene nano band along the length direction of the device, and the density of regional states is 0; In the open state, there is a current in the channel, the first section of the channel is a sawtooth graphene band along the current transmission direction, and there is no band gap in the first section of the channel, which promotes the quantum tunneling effect between the source region and the channel, and enhances the open state current.

Description

technical field [0001] The invention belongs to the technical field of field effect transistors, and proposes a method for using a graphene heterojunction as a conductive channel of a tunneling field effect transistor (TFET) to improve the switching characteristics of the TFET. Background technique [0002] Since the invention of the IC, the Metal Oxide Field Effect Transistor (MOSFET) has been the most popular semiconductor device in the IC, and the feature size of the device has been shrinking according to the prediction of Moore's Law. With the continuous development of device miniaturization, a series of negative effects such as the "short channel effect" of MOSFET due to the shortened channel length have seriously affected the performance of MOSFET devices; The limitation of channel current and working principle leads to the fact that the sub-threshold swing of the MOSFET device cannot be lower than 60meV / dec, and the power consumption of the device is large, which also...

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Application Information

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IPC IPC(8): H01L29/739H01L29/10H01L29/06H01L29/165H01L21/331
CPCH01L29/0665H01L29/1029H01L29/1606H01L29/165H01L29/66045H01L29/7391
Inventor 王晶封路阮良浩赵文生张海鹏
Owner HANGZHOU DIANZI UNIV
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