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UV-LED exposure light source system

A UV-LED, LED light source technology, applied in the field of light source systems, can solve problems such as the inability to adjust the mixing ratio of ultraviolet light, and the inability to ensure whether the energy of the ultraviolet light actually meets the preset value, etc.

Inactive Publication Date: 2019-01-04
LITRO TECH LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] In any case, the UV-LED exposure lighting system in the prior art not only cannot ensure that the energy of the output ultraviolet light really meets the preset value, but also cannot adjust the mixing ratio of various ultraviolet light according to the characteristics of the photoresist material. need to improve

Method used

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Embodiment Construction

[0027] figure 1 A preferred embodiment of the UV-LED exposure light source system 100 of the present invention is shown, which mainly includes an exposure light source module 1 and an alignment light source module 2 . As the name suggests, the exposure light source module 1 is mainly used for exposure, and it includes a plurality of ultraviolet light LED light sources of different wavelengths to generate multiple channels of ultraviolet light of different wavelengths. These ultraviolet light LED light sources are selected from a G light source 11, a Two or more of the H light source 12 , an I light source 13 , a KrF light source (not shown in the figure) and an ArF light source (not shown in the figure). Wherein, the G light source 11 is used to generate the ultraviolet light of the G spectral line (G-line, wavelength 436nm); the H light source 12 is used to generate the ultraviolet light of the H spectral line (H-line, wavelength 405nm); the I light source 13 Used to generat...

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Abstract

The invention relates to a UV-LED exposure light source system comprising an exposure light source module, an alignment light source module, a light mixing system, a beam splitter and an optical system that are arranged along an optical axis, and further comprising a sensor and a control unit. The exposure light source module includes a plurality of ultraviolet light LED light sources of differentwavelengths for generating multiple ultraviolet light of different wavelengths for exposure. The alignment light source module includes at least one visible LED source for generating at least one visible light for alignment. The light mixing system mixes the ultraviolet light into a mixed light. The beam splitter splits the mixed light into a main light and a split light. The optical system illuminates the main light and visible light from the alignment light source module on a reticle. The sensor detects the energy of the light of each wavelength in the splitting. The control unit controls the opening and closing of the ultraviolet light LED light sources of different wavelengths, and can adjust the light output of the ultraviolet light LED light source of the corresponding wavelength according to the detection result of the sensor.

Description

technical field [0001] The invention relates to a light source system for an exposure machine, in particular to a UV-LED exposure light source system using an ultraviolet light emitting diode as a light source. Background technique [0002] The traditional mercury lamp source ultraviolet exposure system is bulky, expensive, and has environmental protection problems. It has been gradually replaced by ultraviolet LED exposure systems. Traditionally, the lighting system is one of the most critical components of the exposure machine. It is generally required to have good lighting uniformity and collimation to ensure that the line width converted from the exposed part is uniform, and the energy utilization rate should be as high as possible to reduce The loss of light energy speeds up the production schedule. [0003] US Patent Publication No. 2010 / 0283978 discloses a UV-LED exposure lighting system using an LED array as a light source, which mixes light sources of multiple grou...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/7005G03F7/70191G03F7/7055G03F7/70075G03F7/70558G03F7/7085G03F7/7015
Inventor 胡德立
Owner LITRO TECH LTD
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