Method for preparing polyetherketoneketone (PEKK) membrane material
A technology of polyether ketone ketone and membrane materials, which is applied in the field of preparation of polyether ketone ketone (PEKK) membrane materials
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0018] Example 1: Take 0.5g of PEKK (where TPC:IPC=5:5) powder and 10ml of NMP solvent in a three-necked flask, heat it to 125°C and magnetically stir it to dissolve completely, and obtain a concentration of 5% (w / v) lysate. The solution was spread on a clean glass plate, placed in an oven at 130°C for 2 hours, and then kept in a vacuum oven at 180°C for 20 hours. Take it out and place it in a muffle furnace at 350°C for 15 minutes for heat treatment to obtain a PEKK film.
Embodiment 2
[0019] Example 2: Take 0.5g of PEKK (where TPC:IPC=6:4) powder and 10ml of NMP solvent in a three-necked flask, heat it to 140°C and magnetically stir to dissolve it completely, and obtain a concentration of 5% (w / v) lysate. The solution was spread on a clean glass plate, placed in an oven at 130°C for 2 hours, and then kept in a vacuum oven at 180°C for 20 hours. Take it out and place it in a muffle furnace at 350°C for 15 minutes for heat treatment to obtain a PEKK film.
Embodiment 3
[0020] Example 3: Take 0.5g of PEKK (where TPC:IPC=7:3) powder and 10ml of NMP solvent in a three-necked flask, heat it to 160°C and magnetically stir to dissolve it completely, and obtain a concentration of 5% (w / v) lysate. The solution was spread on a clean glass plate, placed in an oven at 130°C for 2 hours, and then kept in a vacuum oven at 180°C for 20 hours. Take it out and place it in a muffle furnace at 360°C for 15 minutes for heat treatment to obtain a PEKK film.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com