A mask splicing method of a metal mesh

A metal grid and photomask technology, applied in the field of photomask splicing of metal grids, can solve problems such as inability to meet product requirements

Active Publication Date: 2019-01-22
SHENZHEN ZHILING WEIYE TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] With the advent of the era of human-computer interaction and the Internet of Everything, the application scenarios of capacitive touch panels are becoming more and more extensive, and the requirements for the size of touch panels are getting larger and larger. On the one hand, traditional materials can no longer meet the market's requirements for products, so it is necessary to develop a new material technology that can meet the requirements in all aspects of performance to meet market demand

Method used

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  • A mask splicing method of a metal mesh
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  • A mask splicing method of a metal mesh

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] A method for splicing a photomask of a metal grid, the method comprising the following steps:

[0024] Step 1: Split the metal grid to produce a metal grid that exceeds the maximum size of the mask. It is necessary to split the product at a suitable position first, and follow the split of each part of the product to meet the maximum effective area of ​​the mask;

[0025] Step 2: To avoid line ghosting and line thickening at one time, a special design is made for the regional grid lines at the junction of each part of the product to avoid line ghosting and line thickening after splicing;

[0026] Step 3: Secondary exposure is used during production, first expose part A of the product, and use shading treatment for parts other than A, then expose part B of the product, and use shading treatment for parts other than B;

[0027] Step 4: Secondary avoiding line ghosting and line thickening. Since part A and part B of the product have overlapping overlapping areas, the settin...

Embodiment 2

[0034] A method for splicing a photomask of a metal grid, the method comprising the following steps:

[0035] Step 1: Split the metal grid to produce a metal grid that exceeds the maximum size of the mask. It is necessary to split the product at a suitable position first, and follow the split of each part of the product to meet the maximum effective area of ​​the mask;

[0036] Step 2: To avoid line ghosting and line thickening at one time, a special design is made for the regional grid lines at the junction of each part of the product to avoid line ghosting and line thickening after splicing;

[0037] Step 3: Secondary exposure is used during production, first expose part A of the product, and use shading treatment for parts other than A, then expose part B of the product, and use shading treatment for parts other than B;

[0038] Step 4: Secondary avoiding line ghosting and line thickening. Since part A and part B of the product have overlapping overlapping areas, the settin...

Embodiment 3

[0045] A method for splicing a photomask of a metal grid, the method comprising the following steps:

[0046] Step 1: Split the metal grid to produce a metal grid that exceeds the maximum size of the mask. It is necessary to split the product at a suitable position first, and follow the split of each part of the product to meet the maximum effective area of ​​the mask;

[0047] Step 2: To avoid line ghosting and line thickening at one time, a special design is made for the regional grid lines at the junction of each part of the product to avoid line ghosting and line thickening after splicing;

[0048] Step 3: Secondary exposure is used during production, first expose part A of the product, and use shading treatment for parts other than A, then expose part B of the product, and use shading treatment for parts other than B;

[0049]Step 4: Secondary avoiding line ghosting and line thickening. Since part A and part B of the product have overlapping overlapping areas, the setting...

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Abstract

The invention discloses a mask splicing method of a metal mesh, which comprises the following steps: step 1, splitting the metal mesh; 2, evading the ghost of the circuit and thickening the circuit atone time; 3, adopting secondary exposure during production; Step 4: performing secondary avoidance of line ghosting and line thickening.In Step 1, the metal mesh covers the surface of the photomask,and comprises a product part A and a product part B, in step 3, exposure processing uses an exposure machine to expose a part A and a part B of the product, a light tube of that exposure machine is directly arranged on the top of the product A part and the product B part for exposure treatment. The invention can complete the splicing of the metal mesh through the specially design patent technology, so that the area of the mesh that can be produced is increased by multiple times, and the invention is suitable for popularization.

Description

technical field [0001] The invention relates to the technical field of a metal grid photomask splicing method, in particular to a metal grid photomask splicing method. Background technique [0002] With the advent of the era of human-computer interaction and the Internet of Everything, the application scenarios of capacitive touch panels are becoming more and more extensive, and the requirements for the size of touch panels are getting larger and larger. On the one hand, traditional materials can no longer meet the market's requirements for products, so it is necessary to develop a new material technology that can meet the requirements in all aspects of performance to meet market demand. All aspects of metal grid technology meet the requirements of touch panels, and will be the darling of super-large capacitive touch panels. [0003] As a "transparent" conductive material, metal mesh is widely used in technical fields such as ultra-large capacitive touch panels, EmI shieldi...

Claims

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Application Information

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IPC IPC(8): G06F3/041G03F7/20
CPCG03F7/20G06F3/041
Inventor苏伟王雷王海峰高荣亮陆永荣
OwnerSHENZHEN ZHILING WEIYE TECH